Quantifying the low-energy limit and spectral resolution in valence electron energy loss spectroscopy

被引:14
作者
Aguiar, Jeffery A. [1 ,2 ]
Reed, Bryan W. [2 ]
Ramasse, Quentin M. [3 ]
Erni, Rolf [4 ]
Browning, Nigel D. [1 ,5 ,6 ]
机构
[1] Univ Calif Davis, Dept Chem Engn & Mat Sci, Davis, CA 95618 USA
[2] Lawrence Livermore Natl Lab, Phys & Life Sci Directorate, Livermore, CA 94550 USA
[3] SuperSTEM Lab, Daresbury WA4 4AD, Cheshire, England
[4] EMPA, Swiss Fed Labs Mat Sci & Technol, Electron Microscopy Ctr, CH-8600 Dubendorf, Switzerland
[5] Univ Calif Davis, Dept Mol & Cell Biol, Davis, CA 95618 USA
[6] Pacific NW Natl Lab, Fundamental & Computat Sci Directorate, Richland, WA 99352 USA
基金
英国工程与自然科学研究理事会;
关键词
S/TEM; Electron energy loss spectroscopy; Peak deconvolution; Peak subtraction; VEELS; Retardation effects; Surface effects; Silicon; MULTILAYERED SLABS; INELASTIC-SCATTERING; NOISE RATIO; MONOCHROMATOR; SURFACE; DECONVOLUTION; EELS; ENHANCEMENT;
D O I
10.1016/j.ultramic.2012.08.010
中图分类号
TH742 [显微镜];
学科分类号
摘要
While the development of monochromators for scanning transmission electron microscopes (STEM) has improved our ability to resolve spectral features in the 0-5 eV energy range of the electron energy loss spectrum, the overall benefits relative to unfiltered microscopes have been difficult to quantify. Simple curve fitting and reciprocal space models that extrapolate the expected behavior of the zero-loss peak are not enough to fully exploit the optimal spectral limit and can hinder the ease of interpreting the resulting spectra due to processing-induced artifacts. To address this issue, here we present a quantitative comparison of two processing methods for performing ZLP removal and for defining the low-energy spectral limit applied to three microscopes with different intrinsic emission and energy resolutions. Applying the processing techniques to spectroscopic data obtained from each instrument leads in each case to a marked improvement in the spectroscopic limit, regardless of the technique implemented or the microscope setup. The example application chosen to benchmark these processing techniques is the energy limit obtained from a silicon wedge sample as a function of thickness. Based on these results, we conclude on the possibility to resolve statistically significant spectral features to within a hundred meV of the native instrumental energy spread, opening up the future prospect of tracking phonon peaks as new and improved hardware becomes available. Published by Elsevier B.V.
引用
收藏
页码:130 / 138
页数:9
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