Process considerations for layer-by-layer 3D patterning of silicon, using ion implantation, silicon deposition, and selective silicon etching

被引：3

作者：

Gylfason, Kristinn B. ^{[1
]}

Fischer, Andreas C. ^{[1
]}

Malm, B. Gunnar ^{[2
]}

Radamson, Henry H. ^{[2
]}

Belova, Lyubov M. ^{[3
]}

Niklaus, Frank ^{[1
]}

机构：

[1] KTH Royal Inst Technol, Microsyst Technol Lab MST, SE-10044 Stockholm, Sweden

[2] KTH Royal Inst Technol, Integrated Devices & Circuits Lab IDC, SE-16440 Kista, Sweden

[3] KTH Royal Inst Technol, Engn Mat Phys Lab EMP, SE-10044 Stockholm, Sweden

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2012年 / 30卷 / 06期

关键词：

BEAM; MICROFABRICATION; NANOSTRUCTURES; FABRICATION; BORON;

D O I：

10.1116/1.4756947

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The authors study suitable process parameters, and the resulting pattern formation, in additive layer-by-layer fabrication of arbitrarily shaped three-dimensional (3D) silicon (Si) micro-and nanostructures. The layer-by-layer fabrication process investigated is based on alternating steps of chemical vapor deposition of Si and local implantation of gallium ions by focused ion beam writing. In a final step, the defined 3D structures are formed by etching the Si in potassium hydroxide, where the ion implantation provides the etching selectivity. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4756947]

引用

页数：4

共 32 条

[11] 3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching
Fischer, Andreas C.
Belova, Lyubov M.
Rikers, Yuri G. M.
Malm, B. Gunnar
Radamson, Henry H.
Kolahdouz, Mohammadreza
Gylfason, Kristinn B.
Stemme, Goran
Niklaus, Frank
[J]. ADVANCED FUNCTIONAL MATERIALS, 2012, 22 (19) : 4004 - 4008
[12] Microperiodic structures - Direct writing of three-dimensional webs
Gratson, GM
Xu, MJ
Lewis, JA
[J]. NATURE, 2004, 428 (6981) : 386 - 386
[13] MICROFABRICATION OF 3-DIMENSIONAL BORON STRUCTURES BY LASER CHEMICAL-PROCESSING
JOHANSSON, S
SCHWEITZ, JA
WESTBERG, H
BOMAN, M
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (12) : 5956 - 5963
[14] Bistabilities in pyrolytic laser-CVD of silicon and carbon
Kargl, PB
Arnold, N
Bauerle, D
[J]. APPLIED SURFACE SCIENCE, 1997, 108 (02) : 257 - 262
[15] Three-dimensional nanofabricalion utilizing selective etching of silicon induced by focused ion beam irradiation
Kawasegi, Noritaka
Morita, Noboru
Yamada, Shigeru
Takano, Noboru
Oyama, Tatsuo
Ashida, Kiwatnu
Taniguchi, Jun
Miyamoto, Iwao
[J]. JSME INTERNATIONAL JOURNAL SERIES C-MECHANICAL SYSTEMS MACHINE ELEMENTS AND MANUFACTURING, 2006, 49 (02) : 583 - 589
[16] Lasers and materials in selective laser sintering
Kruth, JP
Wang, X
Laoui, T
Froyen, L
[J]. ASSEMBLY AUTOMATION, 2003, 23 (04) : 357 - 371
[17] Direct ink writing of 3D functional materials
Lewis, Jennifer A.
[J]. ADVANCED FUNCTIONAL MATERIALS, 2006, 16 (17) : 2193 - 2204
[18] Chemical vapor deposition of undoped and in-situ boron- and arsenic-doped epitaxial and polycrystalline silicon films grown using silane at reduced pressure
Pejnefors, J
Zhang, SL
Radamson, HH
Grahn, JV
Östling, M
[J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (03) : 1655 - 1663
[19] Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching
Qian, H. X.
Zhou, Wei
Miao, Jianmin
Lim, Lennie E. N.
Zeng, X. R.
[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2008, 18 (03)
[20] A review of focused ion beam applications in microsystem technology
Reyntjens, S
Puers, R
[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2001, 11 (04) : 287 - 300

← 1 2 3 4 →