Analysis of composition fluctuations in AlxGa1-xN

被引:16
|
作者
Neubauer, B
Rosenauer, A
Gerthsen, D
Ambacher, O
Stutzmann, M
Albrecht, M
Strunk, HP
机构
[1] Univ Karlsruhe, Lab Elektronenmikroskopie, D-76128 Karlsruhe, Germany
[2] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[3] Univ Erlangen Nurnberg, Inst Werkstoffwissensch, D-91058 Erlangen, Germany
关键词
decomposition; nitrides; transmission electron microscopy </kwdg*;
D O I
10.1016/S0921-5107(98)00397-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Composition fluctuations in AlxGa1-xN-layers (x = 0.25 and 0.35) are investigated on an atomic scale by high-resolution transmission electron microscopy (HRTEM). The samples were grown by plasma induced molecular beam epitaxy on Al2O3 (0001). A strain state analysis of the cross-sectional HRTEM micrographs is performed with the digital analysis of lattice images (DALI) program package. Composition profiles on an atomic scale are derived by the measurement of the distances between intensity maxima positions in the HRTEM image. The analyses revealed different areas in the AlxGa1-xN-layers with either homogeneous or 'striped' contrast. Ln the striped areas the analyses indicate a strong decomposition that leads to the formation of self-organized superlattice structures. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:182 / 185
页数:4
相关论文
共 50 条
  • [21] MOVPE growth and characterization of AlxGa1-xN
    GES, Montpellier, France
    Mater Sci Eng B Solid State Adv Technol, 1-3 (219-222):
  • [22] Characterization of photoconductivity in AlxGa1-xN materials
    Seghier, D.
    Gislason, H. P.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (09)
  • [23] N-VACANCIES IN ALXGA1-XN
    JENKINS, DW
    DOW, JD
    TSAI, MH
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) : 4130 - 4133
  • [24] A Theoretical Calculation of the Impact of GaN Cap and AlxGa1-xN Barrier Thickness Fluctuations on Two-Dimensional Electron Gas in a GaN/AlxGa1-xN/GaN Heterostructure
    Liu, Guipeng
    Wu, Ju
    Lu, Yanwu
    Zhang, Biao
    Li, Chengming
    Sang, Ling
    Song, Yafeng
    Shi, Kai
    Liu, Xianglin
    Yang, Shaoyan
    Zhu, Qinsheng
    Wang, Zhanguo
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (12) : 4272 - 4275
  • [25] AlxGa1-xN based materials and heterostructures
    Kung, P
    Saxler, A
    Walker, D
    Zhang, X
    Lavado, R
    Kim, KS
    Razeghi, M
    III-V NITRIDES, 1997, 449 : 79 - 84
  • [26] Problems with cracking of AlxGa1-xN layers
    Dumiszewska, E
    Lenkiewicz, D
    Strupinski, W
    Jasik, A
    Jakiela, RS
    Wesolowski, M
    OPTICA APPLICATA, 2005, 35 (01) : 111 - 115
  • [27] MOVPE growth and characterization of AlxGa1-xN
    Ruffenach-Clur, S
    Briot, O
    Rouviere, JL
    Gil, B
    Aulombard, RL
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 50 (1-3): : 219 - 222
  • [28] Theoretical study of the AlxGa1-xN alloys
    de Paiva, R
    Alves, JLA
    Nogueira, RA
    de Oliveira, C
    Alves, HWL
    Scolfaro, LMR
    Leite, JR
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 93 (1-3): : 2 - 5
  • [29] Critical issues in AlxGa1-xN growth
    Amano, H
    Akasaki, I
    OPTICAL MATERIALS, 2002, 19 (01) : 219 - 222
  • [30] Optical properties of AlxGa1-xN alloy
    Takeuchi, Katsuki
    Adachi, Sadao
    Ohtsuka, Kohji
    JOURNAL OF APPLIED PHYSICS, 2010, 107 (02)