Anomalous Potential Dependence in Homoepitaxial Cu(001) Electrodeposition: An In Situ Surface X-Ray Diffraction Study

被引：21

作者：

Golks, Frederik ^{[1
,2
]}

Stettner, Jochim ^{[1
]}

Gruender, Yvonne ^{[1
]}

Krug, Klaus ^{[1
]}

Zegenhagen, Joerg ^{[2
]}

Magnussen, Olaf M. ^{[1
]}

机构：

[1] Univ Kiel, Inst Expt & Angew Phys, D-24098 Kiel, Germany

[2] European Synchrotron Radiat Facil, F-38000 Grenoble, France

来源：

PHYSICAL REVIEW LETTERS | 2012年 / 108卷 / 25期

关键词：

CU(100) ELECTRODES; AU(100) ELECTRODES; ACID-SOLUTION; STM; CHLORIDE; DISSOLUTION; ADLAYERS; HCL;

D O I：

10.1103/PhysRevLett.108.256101

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Homoepitaxial Cu electrodeposition on Cu(001) in chloride-containing electrolyte was studied by time-resolved in situ surface x-ray diffraction at growth rates up to 38 ML/min. With increasing Cu electrode potential, transitions from step-flow to layer-by-layer and then to multilayer growth are observed. This potential dependence is opposite to that expected theoretically and found experimentally for the Au(001) homoepitaxial electrodeposition [K. Krug et al., Phys. Rev. Lett. 96, 246101 (2006)]. The anomalous behavior is rationalized by a decisive influence of the ordered c(2 x 2)-Cl adlayer on the surface energy landscape, specifically on the effective change in dipole moment during adatom diffusion.

引用

页数：5