Anomalous Potential Dependence in Homoepitaxial Cu(001) Electrodeposition: An In Situ Surface X-Ray Diffraction Study

被引：21
作者：
Golks, Frederik [1 ,2 ]
Stettner, Jochim [1 ]
Gruender, Yvonne [1 ]
Krug, Klaus [1 ]
Zegenhagen, Joerg [2 ]
Magnussen, Olaf M. [1 ]
机构：
[1] Univ Kiel, Inst Expt & Angew Phys, D-24098 Kiel, Germany
[2] European Synchrotron Radiat Facil, F-38000 Grenoble, France
来源：
PHYSICAL REVIEW LETTERS | 2012年 / 108卷 / 25期
关键词：
CU(100) ELECTRODES; AU(100) ELECTRODES; ACID-SOLUTION; STM; CHLORIDE; DISSOLUTION; ADLAYERS; HCL;
D O I：
10.1103/PhysRevLett.108.256101
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Homoepitaxial Cu electrodeposition on Cu(001) in chloride-containing electrolyte was studied by time-resolved in situ surface x-ray diffraction at growth rates up to 38 ML/min. With increasing Cu electrode potential, transitions from step-flow to layer-by-layer and then to multilayer growth are observed. This potential dependence is opposite to that expected theoretically and found experimentally for the Au(001) homoepitaxial electrodeposition [K. Krug et al., Phys. Rev. Lett. 96, 246101 (2006)]. The anomalous behavior is rationalized by a decisive influence of the ordered c(2 x 2)-Cl adlayer on the surface energy landscape, specifically on the effective change in dipole moment during adatom diffusion.
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页数：5
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