Phase transformation in sputter-deposited PdMn and PdPtMn thin films

被引：2
|
作者：
Huang, ML [1 ]
Chang, YA
机构：
[1] Iowa State Univ, Ames Lab, Mat & Engn Phys Program, Ames, IA 50011 USA
[2] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA
来源：
JOURNAL OF APPLIED PHYSICS | 2006年 / 99卷 / 02期
关键词：
D O I：
10.1063/1.2162988
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The phase transformations of PdMn and PdPtMn films were investigated using differential scanning calorimetry (DSC), x-ray diffraction (XRD), and transmission electron microscopy (TEM). The enthalpy for the fcc to L1(0) transformation in the PdMn and PdPtMn thin films has been measured by DSC as -5.4 and -7.6 kJ/mol at., respectively. The fcc to L1(0) phase transformation was identified by XRD and TEM on as-deposited and annealed samples. The transition temperature for the PdPtMn is approximately 40 degrees C lower than that for PdMn. PdPtMn thin films have better corrosion resistance than PdMn. (c) 2006 American Institute of Physics.
引用
收藏
页码：1 / 4
页数：4
相关论文
共 50 条
  • [1] An investigation of phase transformation behavior in sputter-deposited PtMn thin films
    Ji, C. -X.
    Ladwig, Peter E.
    Ott, Ronald D.
    Yang, Y.
    Yang, Joshua J.
    Chang, Y. Austin
    Linville, Eric S.
    Gao, Jenny
    Pant, Bharat B.
    JOM, 2006, 58 (06) : 50 - 54
  • [2] Phase transformation of thin sputter-deposited tungsten films at room temperature
    Rossnagel, SM
    Noyan, IC
    Cabral, C
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05): : 2047 - 2051
  • [3] An investigation of phase transformation behavior in sputter-deposited PtMn thin films
    C. -X. Ji
    Peter F. Ladwig
    Ronald D. Ott
    Y. Yang
    Joshua J. Yang
    Y. Austin Chang
    Eric S. Linville
    Jenny Gao
    Bharat B. Pant
    JOM, 2006, 58 : 50 - 54
  • [4] Paramagnetic-to-antiferromagnetic phase transformation in sputter-deposited Ni-Mn thin films
    Peter F. Ladwig
    Ying Yang
    Ling Ding
    I-Fei Tsu
    Y. Austin Chang
    Journal of Electronic Materials, 2003, 32 : 1155 - 1159
  • [5] Paramagnetic-to-antiferromagnetic phase transformation in sputter-deposited Ni-Mn thin films
    Ladwig, PF
    Yang, Y
    Ding, L
    Tsu, IF
    Chang, YA
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (11) : 1155 - 1159
  • [6] Oxygen in sputter-deposited ZnTe thin films
    Merita, S
    Krämer, T
    Mogwitz, B
    Franz, B
    Polity, A
    Meyer, BK
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3, NO 4, 2006, 3 (04): : 960 - +
  • [7] Characterization of sputter-deposited TiPdNi thin films
    Tian, QC
    Wu, JS
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2002, 12 (04) : 702 - 706
  • [8] Characterization of sputter-deposited TiPdNi thin films
    田青超
    吴建生
    Transactions of Nonferrous Metals Society of China, 2002, (04) : 702 - 706
  • [9] EFFECT OF RESIDUAL STRESS ON THE MARTENSITIC TRANSFORMATION OF SPUTTER-DEPOSITED SMA THIN FILMS
    L.Wang
    in revised form 27 November 2001
    Acta Metallurgica Sinica(English Edition), 2002, (04) : 391 - 395
  • [10] Crystallization and martensitic transformation of sputter-deposited Ti-Ni thin films
    Kawamura, Yoshio
    Gyobu, Atsuo
    Horikawa, Hiroshi
    Saburi, Toshio
    Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals, 1996, 60 (10): : 921 - 927
12345