机构:
Inst Phys NAS Ukraine, Kiev, UkraineInst Phys NAS Ukraine, Kiev, Ukraine
Piun, V. M.
[1
]
Tsiolko, V. V.
论文数: 0引用数: 0
h-index: 0
机构:
Inst Phys NAS Ukraine, Kiev, UkraineInst Phys NAS Ukraine, Kiev, Ukraine
Tsiolko, V. V.
[1
]
Yaroshchuk, O. V.
论文数: 0引用数: 0
h-index: 0
机构:
Inst Phys NAS Ukraine, Kiev, UkraineInst Phys NAS Ukraine, Kiev, Ukraine
Yaroshchuk, O. V.
[1
]
机构:
[1] Inst Phys NAS Ukraine, Kiev, Ukraine
[2] Natl Tech Univ Ukraine KPI, Kiev, Ukraine
来源:
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY
|
2013年
/
01期
关键词:
ARGON;
D O I:
暂无
中图分类号:
O57 [原子核物理学、高能物理学];
学科分类号:
070202 ;
摘要:
Uniform planar alignment of liquid crystals is obtained by polyimide films obliquely treated by a stream of argon plasma from capacitive RF discharge at atmospheric pressure. Two liquid crystal alignment modes are discovered differing by their longitudinal or transverse orientation with respect to treatment direction. Optimum parameters of the treatment for obtaining these orientation modes are determined.