Oxidation and passivation of the uranium nitride (001) surface

被引:4
作者
Bright, E. Lawrence [1 ,2 ]
Darnbrough, J. E. [1 ]
Goddard, D. T. [3 ]
Griffiths, I. [4 ]
Cattelan, M. [5 ]
Springell, R. [1 ]
机构
[1] Univ Bristol, Sch Phys, Tyndall Ave, Bristol BS8 1TL, Glos, England
[2] European Synchrotron Radiat Facil, 71 Ave Martyrs, F-38040 Grenoble, France
[3] Univ Oxford, Dept Mat, Parks Rd, Oxford OX1 3PH, Oxon, England
[4] Preston Lab, Natl Nucl Lab, Preston PR4 0XJ, Lancs, England
[5] Univ Bristol, Sch Chem, Cantocks Close, Bristol BS8 1TS, Glos, England
基金
英国工程与自然科学研究理事会;
关键词
Sputtered films; Oxidation; XPS; XRD; TEM; OXYGEN SOLUBILITY; MONONITRIDE; UN; BEHAVIORS; OXIDES;
D O I
10.1016/j.corsci.2022.110705
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The oxidation of uranium mononitride is a potential issue when considering this material as a nuclear fuel. This work investigates the rate and mechanism of this reaction at room temperature, giving insight into fuel surface oxidation during manufacture and storage. Chemical and structural investigation of the ideal surface of an epitaxial (001) UN thin film, shows that a UO2+xNy layer forms on the surface, highlighting the need for better understanding of the U-N-O system. Below this, a U2N3 interlayer is detected. The topotactic formation of these layers is predicted to play a critical role in the passivation measured during long-duration structural investigation.
引用
收藏
页数:7
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