Structural and mechanical properties of reactively sputtered TiAlC nanostructured hard coatings

被引:17
作者
Chaliyawala, Harsh A. [1 ]
Gupta, Gaurav [1 ,2 ]
Kumar, Praveen [1 ]
Srinivas, G. [1 ]
Siju [1 ]
Barshilia, Harish C. [1 ]
机构
[1] CSIR Natl Aerosp Labs, Surface Engn Div, Nanomat Lab, Bangalore 560017, Karnataka, India
[2] Birla Inst Technol & Sci, Mech Engn Dept, Pilani, Rajasthan, India
关键词
Titanium aluminum carbide; Magnetron sputtering; Hard coating; Bias voltage; THIN-FILMS; CARBIDE; TIN; MICROSTRUCTURE; CERAMICS; DC; NANOINDENTATION; DEPOSITION;
D O I
10.1016/j.surfcoat.2015.06.032
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
TiAlC nanostructured hard coatings have been deposited on Si(100) substrates by four-cathode reactive pulsed direct current unbalanced magnetron sputtering at various process conditions. The effects of Al and Con the compositional, mechanical and micro-structural properties of TiAlC coatings have been investigated using X-ray diffraction (XRD), micro-Raman spectroscopy, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, atomic force microscopy and nanoindentation hardness tester. Furthermore, the effect of substrate bias on the surface morphology, micro-structure and mechanical properties of TiAlC coatings is examined in detail. Formation of Ti3AlC(111) phase along with inclusion of TiC and amorphous carbon phases has been confirmed by XRD and micro-Raman spectroscopy studies. The optimized TiAlC coating exhibited a maximum hardness of similar to 30 GPa and elastic modulus of 288 GPa. Analysis of the nanoindentation data indicated that the resistance to plastic deformation (H-3/E*(2)) and elastic strain to failure (H/E*) decrease with C and Al contents in the TiAlC coatings, whereas, these properties increase with an increase in the substrate bias due to grain size refinement. Lastly, fracture toughness of TiAlC coating has also been calculated using a cube corner indenter and the optimized coating exhibited a maximum toughness of similar to 1.38 MPa m(1/2) at a load of 50 mN. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:431 / 439
页数:9
相关论文
共 36 条
[1]  
Barshilia H.C., 2010, HDB NANOSTRUCTURED T, P427
[2]   Deposition of TiAlN coatings using reactive bipolar-pulsed direct current unbalanced magnetron sputtering [J].
Barshilia, Harish C. ;
Yogesh, K. ;
Rajam, K. S. .
VACUUM, 2008, 83 (02) :427-434
[3]   Optical properties and thermal stability of TiAlN/AlON tandem absorber prepared by re active DC/RF magnetron sputtering [J].
Barshilia, Harish C. ;
Selvakumar, N. ;
Rajam, K. S. ;
Biswas, A. .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2008, 92 (11) :1425-1433
[4]   Deposition and characterization of TiAlSiN nanocomposite coatings prepared by reactive pulsed direct current unbalanced magnetron sputtering [J].
Barshilia, Harish C. ;
Ghosh, Moumita ;
Shashidhara ;
Ramakrishna, Raja ;
Rajam, K. S. .
APPLIED SURFACE SCIENCE, 2010, 256 (21) :6420-6426
[5]   Nanoindentation and atomic force microscopy measurements on reactively sputtered TiN coatings [J].
Barshilia, HC ;
Rajam, KS .
BULLETIN OF MATERIALS SCIENCE, 2004, 27 (01) :35-41
[6]  
Barsoum MW, 2001, AM SCI, V89, P334, DOI 10.1511/2001.4.334
[7]   Characterization of TiN, TiC and TiCN coatings on Ti-50.6 at.% Ni alloy deposited by PIII and deposition technique [J].
Cheng, Y. ;
Zheng, Y. F. .
SURFACE & COATINGS TECHNOLOGY, 2007, 201 (9-11) :4909-4912
[8]   REACTIVELY SPUTTERED TITANIUM CARBIDE THIN-FILMS - PREPARATION AND PROPERTIES [J].
EIZENBERG, M ;
MURARKA, SP .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) :3190-3194
[9]  
El -Awadi GA, 2013, ARAB J NUCL SCI APPL, V46, P195
[10]  
Fischer Cripps A.C., 2002, NANOINDENTATION