Dielectric Properties of Sol-Gel Derived MgAl2O4 Thin Films

被引:0
作者
Tseng, Ching-Fang [1 ]
Hsu, Cheng-Hsing [1 ]
Lai, Chun-Hung [1 ]
机构
[1] Natl United Univ, Dept Elect Engn, Kung Ching Li 36003, Miao Li, Taiwan
来源
NEW TRENDS IN MECHATRONICS AND MATERIALS ENGINEERING | 2012年 / 151卷
关键词
Sol-Gel Method; Dielectric Properties; MgAl2O4 thin films; HIGH-QUALITY; GROWTH;
D O I
10.4028/www.scientific.net/AMM.151.314
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
This paper describes microstructure characteristics of MgAl2O4 thin films were deposited by sot-gel method with various preheating temperatures and annealing temperatures. Particular attention will be paid to the effects of a thermal treatment in air ambient on the physical properties. The annealed films were characterized using X-ray diffraction. The surface morphologies of treatment film were examined by scanning electron microscopy and atomic force microscopy. At a preheating temperature of 300 degrees C and an annealing temperature of 700 degrees C, the MgAl2O4 films with 9 mu m thickness possess a dielectric constant of 9 at 1 kHz and a dissipation factor of 0.18 at 1 kHz.
引用
收藏
页码:314 / 318
页数:5
相关论文
共 10 条
[1]  
Cullity B. D., 1978, ELEMENTS XRAY DIFFRA
[2]  
George T, 1996, APPL PHYS LETT, V68, P337, DOI 10.1063/1.116708
[3]   HIGH-QUALITY GAN EPITAXIAL LAYER GROWN BY METALORGANIC VAPOR-PHASE EPITAXY ON (111) MGAL2O4 SUBSTRATE [J].
KURAMATA, A ;
HORINO, K ;
DOMEN, K ;
SHINOHARA, K ;
TANAHASHI, T .
APPLIED PHYSICS LETTERS, 1995, 67 (17) :2521-2523
[4]   GAAS-LAYERS DEPOSITED ON (001) MGAL2O4 BY MOLECULAR-BEAM METHOD [J].
MARUYAMA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1985, 24 (03) :363-364
[5]   PREPARATION OF EPITAXIAL ABO3 PEROVSKITE-TYPE OXIDE THIN-FILMS ON A (100)MGAL2O4/SI SUBSTRATE [J].
MATSUBARA, S ;
MIURA, S ;
MIYASAKA, Y ;
SHOHATA, N .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (12) :5826-5832
[6]   X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION OF MGAL2O4 THIN-FILMS FOR HUMIDITY SENSORS [J].
MATTOGNO, G ;
RIGHINI, G ;
MONTESPERELLI, G ;
TRAVERSA, E .
JOURNAL OF MATERIALS RESEARCH, 1994, 9 (06) :1426-1433
[7]   THE EFFECT OF ZRO2 DOPING ON MECHANICAL AND DIELECTRIC-PROPERTIES OF AL2O3 AND MGAL2O4 [J].
MOLLA, J ;
IBARRA, A ;
FROST, HM ;
CLINARD, FW ;
KENNEDY, JC ;
DECASTRO, MJ .
JOURNAL OF NUCLEAR MATERIALS, 1991, 179 :375-378
[8]   DEVELOPMENT OF A NEW MBE GROWTH METHOD FOR FABRICATION OF HIGH-QUALITY, DOUBLE EPITAXIAL SI/GAMMA-AL2O3/SI STRUCTURES [J].
OGATA, H ;
HANAFUSA, H ;
YONEDA, K .
JOURNAL OF CRYSTAL GROWTH, 1989, 95 (1-4) :500-504
[9]   Deposition of high quality wurtzite GaN films over cubic (111) MgAl2O4 substrates using low pressure metalorganic chemical vapor deposition [J].
Sun, CJ ;
Yang, JW ;
Chen, Q ;
Khan, MA ;
George, T ;
ChangChien, P ;
Mahajan, S .
APPLIED PHYSICS LETTERS, 1996, 68 (08) :1129-1131
[10]   THE MICROSTRUCTURE OF SPUTTER-DEPOSITED COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :3059-3065