All ITO-based transparent resistive switching random access memory using oxygen doping method

被引:28
作者
Kim, Hee-Dong [1 ]
Yun, Min Ju [1 ]
Kim, Sungho [1 ]
机构
[1] Sejong Univ, Dept Elect Engn, Seoul 143747, South Korea
关键词
Transparent memory; Oxygen-doped indium thin oxide; Unipolar switching; ELECTRODES;
D O I
10.1016/j.jallcom.2015.09.076
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Recently, transparent memory would be useful in invisible electronics. In this work, for the first time we present a feasibility of stable unipolar resistive switching (RS) characteristics with reset current of submicron ampere for the fully transparent ITO/oxygen-doped ITO/ITO memory capacitors, i.e., all ITO structures, produced by sputtering method, which shows a high optical transmittance of approximately 80% in the visible region as well as near ultra-violet region. In addition, in a RS test to evaluate a reliability for the proposed memory devices, we observed a stable endurance of > 100 cycles and a retention time of > 10(4) s at 85 degrees C, with a current ratio of similar to 10(2) to similar to 10(3). This result indicates that this transparent memory by engineering the amount of oxygen ions within the ITO films could be a milestone for future see-through electronic devices. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:534 / 538
页数:5
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