Vertical Light-Emitting Diode Fabrication by Controlled Spalling

被引:24
作者
Bedell, Stephen W. [1 ]
Bayram, Can [1 ]
Fogel, Keith [1 ]
Lauro, Paul [1 ]
Kiser, Jonathan [1 ]
Ott, John [1 ]
Zhu, Yu [1 ]
Sadana, Devendra [1 ]
机构
[1] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
GAN THIN-FILMS; EFFICIENCY; SUBSTRATE; CRACKING;
D O I
10.7567/APEX.6.112301
中图分类号
O59 [应用物理学];
学科分类号
摘要
A fracture-based layer transfer technique referred to as controlled spalling was used to separate a conventional InGaN/GaN multiple quantum well light-emitting diode (LED) structure from a 50 mm sapphire wafer enabling the formation of vertical spalled LEDs (SLEDs). A 25-mu m-thick tensile Ni layer was electrodeposited on the surface of the wafer, followed by the application of a polyimide tape layer. By mechanically guiding the tape layer, a 3-mu m-thick layer of the LED epitaxy was removed. Transmission electron microscopy imaging indicated that spalling preserved the quality of the epitaxial layers, and electroluminescence verifies the operation of the SLED. (C) 2013 The Japan Society of Applied Physics
引用
收藏
页数:4
相关论文
共 20 条
[1]   Comprehensive study of blue and green multi-quantum-well light-emitting diodes grown on conventional and lateral epitaxial overgrowth GaN [J].
Bayram, C. ;
Pau, J. L. ;
McClintock, R. ;
Razeghi, M. .
APPLIED PHYSICS B-LASERS AND OPTICS, 2009, 95 (02) :307-314
[2]   Layer transfer by controlled spalling [J].
Bedell, Stephen W. ;
Fogel, Keith ;
Lauro, Paul ;
Shahrjerdi, Davood ;
Ott, John A. ;
Sadana, Devendra .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (15)
[3]   Kerf-Less Removal of Si, Ge, and III-V Layers by Controlled Spalling to Enable Low-Cost PV Technologies [J].
Bedell, Stephen W. ;
Shahrjerdi, Davood ;
Hekmatshoar, Bahman ;
Fogel, Keith ;
Lauro, Paul A. ;
Ott, John A. ;
Sosa, Norma ;
Sadana, Devendra .
IEEE JOURNAL OF PHOTOVOLTAICS, 2012, 2 (02) :141-147
[4]   Hardness and fracture toughness of bulk single crystal gallium nitride [J].
Drory, MD ;
Ager, JW ;
Suski, T ;
Grzegory, I ;
Porowski, S .
APPLIED PHYSICS LETTERS, 1996, 69 (26) :4044-4046
[5]   Leakage current improvement of nitride-based light emitting diodes using CrN buffer layer and its vertical type application by chemical lift-off process [J].
Fujii, Katsushi ;
Lee, Seogwoo ;
Ha, Jun-Seok ;
Lee, Hyun-Jae ;
Lee, Hyo-Jong ;
Lee, Sang-Hyun ;
Kato, Takashi ;
Cho, Meoung-Whan ;
Yao, Takafumi .
APPLIED PHYSICS LETTERS, 2009, 94 (24)
[6]   Increase in the extraction efficiency of GaN-based light-emitting diodes via surface roughening [J].
Fujii, T ;
Gao, Y ;
Sharma, R ;
Hu, EL ;
DenBaars, SP ;
Nakamura, S .
APPLIED PHYSICS LETTERS, 2004, 84 (06) :855-857
[7]   Photoelectrochemical Liftoff of Patterned Sapphire Substrate for Fabricating Vertical Light-Emitting Diode [J].
Hsieh, Chieh ;
Chen, Horng-Shyang ;
Liao, Che-Hao ;
Chen, Chih-Yen ;
Lin, Chun-Han ;
Lin, Cheng-Hung ;
Ting, Shao-Ying ;
Yao, Yu-Feng ;
Chen, Hao-Tsung ;
Kiang, Yean-Woei ;
Yang, Chih-Chung .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2012, 24 (19) :1775-1777
[8]   Strain-related phenomena in GaN thin films [J].
Kisielowski, C ;
Kruger, J ;
Ruvimov, S ;
Suski, T ;
Ager, JW ;
Jones, E ;
LilientalWeber, Z ;
Rubin, M ;
Weber, ER ;
Bremser, MD ;
Davis, RF .
PHYSICAL REVIEW B, 1996, 54 (24) :17745-17753
[9]   Status and future of high-power light-emitting diodes for solid-state lighting [J].
Krames, Michael R. ;
Shchekin, Oleg B. ;
Mueller-Mach, Regina ;
Mueller, Gerd O. ;
Zhou, Ling ;
Harbers, Gerard ;
Craford, M. George .
JOURNAL OF DISPLAY TECHNOLOGY, 2007, 3 (02) :160-175
[10]   HIGH-BRIGHTNESS INGAN/ALGAN DOUBLE-HETEROSTRUCTURE BLUE-GREEN-LIGHT-EMITTING DIODES [J].
NAKAMURA, S ;
MUKAI, T ;
SENOH, M .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (12) :8189-8191