Vertical Light-Emitting Diode Fabrication by Controlled Spalling

被引:24
作者
Bedell, Stephen W. [1 ]
Bayram, Can [1 ]
Fogel, Keith [1 ]
Lauro, Paul [1 ]
Kiser, Jonathan [1 ]
Ott, John [1 ]
Zhu, Yu [1 ]
Sadana, Devendra [1 ]
机构
[1] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
GAN THIN-FILMS; EFFICIENCY; SUBSTRATE; CRACKING;
D O I
10.7567/APEX.6.112301
中图分类号
O59 [应用物理学];
学科分类号
摘要
A fracture-based layer transfer technique referred to as controlled spalling was used to separate a conventional InGaN/GaN multiple quantum well light-emitting diode (LED) structure from a 50 mm sapphire wafer enabling the formation of vertical spalled LEDs (SLEDs). A 25-mu m-thick tensile Ni layer was electrodeposited on the surface of the wafer, followed by the application of a polyimide tape layer. By mechanically guiding the tape layer, a 3-mu m-thick layer of the LED epitaxy was removed. Transmission electron microscopy imaging indicated that spalling preserved the quality of the epitaxial layers, and electroluminescence verifies the operation of the SLED. (C) 2013 The Japan Society of Applied Physics
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页数:4
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共 20 条
  • [1] Comprehensive study of blue and green multi-quantum-well light-emitting diodes grown on conventional and lateral epitaxial overgrowth GaN
    Bayram, C.
    Pau, J. L.
    McClintock, R.
    Razeghi, M.
    [J]. APPLIED PHYSICS B-LASERS AND OPTICS, 2009, 95 (02): : 307 - 314
  • [2] Layer transfer by controlled spalling
    Bedell, Stephen W.
    Fogel, Keith
    Lauro, Paul
    Shahrjerdi, Davood
    Ott, John A.
    Sadana, Devendra
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (15)
  • [3] Kerf-Less Removal of Si, Ge, and III-V Layers by Controlled Spalling to Enable Low-Cost PV Technologies
    Bedell, Stephen W.
    Shahrjerdi, Davood
    Hekmatshoar, Bahman
    Fogel, Keith
    Lauro, Paul A.
    Ott, John A.
    Sosa, Norma
    Sadana, Devendra
    [J]. IEEE JOURNAL OF PHOTOVOLTAICS, 2012, 2 (02): : 141 - 147
  • [4] Hardness and fracture toughness of bulk single crystal gallium nitride
    Drory, MD
    Ager, JW
    Suski, T
    Grzegory, I
    Porowski, S
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (26) : 4044 - 4046
  • [5] Leakage current improvement of nitride-based light emitting diodes using CrN buffer layer and its vertical type application by chemical lift-off process
    Fujii, Katsushi
    Lee, Seogwoo
    Ha, Jun-Seok
    Lee, Hyun-Jae
    Lee, Hyo-Jong
    Lee, Sang-Hyun
    Kato, Takashi
    Cho, Meoung-Whan
    Yao, Takafumi
    [J]. APPLIED PHYSICS LETTERS, 2009, 94 (24)
  • [6] Increase in the extraction efficiency of GaN-based light-emitting diodes via surface roughening
    Fujii, T
    Gao, Y
    Sharma, R
    Hu, EL
    DenBaars, SP
    Nakamura, S
    [J]. APPLIED PHYSICS LETTERS, 2004, 84 (06) : 855 - 857
  • [7] Photoelectrochemical Liftoff of Patterned Sapphire Substrate for Fabricating Vertical Light-Emitting Diode
    Hsieh, Chieh
    Chen, Horng-Shyang
    Liao, Che-Hao
    Chen, Chih-Yen
    Lin, Chun-Han
    Lin, Cheng-Hung
    Ting, Shao-Ying
    Yao, Yu-Feng
    Chen, Hao-Tsung
    Kiang, Yean-Woei
    Yang, Chih-Chung
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2012, 24 (19) : 1775 - 1777
  • [8] Strain-related phenomena in GaN thin films
    Kisielowski, C
    Kruger, J
    Ruvimov, S
    Suski, T
    Ager, JW
    Jones, E
    LilientalWeber, Z
    Rubin, M
    Weber, ER
    Bremser, MD
    Davis, RF
    [J]. PHYSICAL REVIEW B, 1996, 54 (24) : 17745 - 17753
  • [9] Status and future of high-power light-emitting diodes for solid-state lighting
    Krames, Michael R.
    Shchekin, Oleg B.
    Mueller-Mach, Regina
    Mueller, Gerd O.
    Zhou, Ling
    Harbers, Gerard
    Craford, M. George
    [J]. JOURNAL OF DISPLAY TECHNOLOGY, 2007, 3 (02): : 160 - 175
  • [10] HIGH-BRIGHTNESS INGAN/ALGAN DOUBLE-HETEROSTRUCTURE BLUE-GREEN-LIGHT-EMITTING DIODES
    NAKAMURA, S
    MUKAI, T
    SENOH, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1994, 76 (12) : 8189 - 8191