Comparison of fused silica and oxyfluoride glass on laser induced initial damage morphology

被引：0

作者：

Cheng, Qiang ^{[1
]}

Huang, Jin

Zhou, Xinda

Sun, Laixi

Jiang, Xiaodong

Sui, Zhan

Hou, Chaoqi

Wei, Wei ^{[1
]}

Peng, Bo ^{[1
]}

机构：

[1] Nanjing Univ Posts & Telecommun, Inst Optoelect Engn, Nanjing 210046, Jiangsu, Peoples R China

来源：

PACIFIC RIM LASER DAMAGE 2013: OPTICAL MATERIALS FOR HIGH POWER LASERS | 2013年 / 8786卷

关键词：

laser induced damage; initial damage morphology; oxyfluoride glass; fused silica; OPTICAL-COMPONENTS; 355; NM; FACILITY; PULSES; GROWTH; SITES;

D O I：

10.1117/12.2019995

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A novel oxyfluoride glass (OFG) was prepared. The laser induced damage threshold (LIDT) of the novel OFG is 24.9% higher than fused silica under 355nm nanosecond laser irradiation by R-on-1 procedure. Characterization by optical microscope and scanning electron microscope shows that the initial damage morphologies of two kind of materials are significantly different. Experiment results indicate that the novel OFG can be a good candidate component material for high energy laser applications.

引用

页数：7

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