Femtosecond to Nanosecond Laser Damage in Dielectric Materials

被引：2

作者：

Rudolph, W. ^{[1
]}

Emmert, L. A. ^{[1
]}

Rodriguez, C. ^{[1
]}

Sun, Z. ^{[1
]}

Zhang, X. ^{[1
]}

Xu, Y. ^{[1
]}

Menoni, C. S.

Langston, P. F.

Krous, E.

Patel, D.

机构：

[1] Univ New Mexico, Dept Phys & Astron, Albuquerque, NM 87131 USA

来源：

PACIFIC RIM LASER DAMAGE 2013: OPTICAL MATERIALS FOR HIGH POWER LASERS | 2013年 / 8786卷

关键词：

BULK; DEFECTS; SILICA;

D O I：

10.1117/12.2020356

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a consistent model supported by experimental data of damage of dielectric films by femtosecond to nanosecond pulses. Special emphasis is given to the role of defects and transient processes in the material. New imaging and diagnostic techniques are discussed to characterize the film performance.

引用

页数：7

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