Toluene adsorption on Si(111)7 x 7 studied by synchrotron-radiation photoemission

被引:17
作者
Carbone, M
Piancastelli, MN
Casaletto, MP
Zanoni, R
Comtet, G
Dujardin, G
Hellner, L
机构
[1] Univ Roma Tor Vergata, Dip Sci & Tecnol Chim, I-00133 Rome, Italy
[2] CNR, Ist Chim Mat, I-00016 Monterotondo, RM, Italy
[3] Univ Roma La Sapienza, INFM, I-00185 Rome, Italy
[4] Univ Roma La Sapienza, Dip Chim, I-00185 Rome, Italy
[5] Ctr Univ Paris Sud, LURE, F-91405 Orsay, France
[6] Ctr Univ Paris Sud, Photophys Mol Lab, F-91405 Orsay, France
关键词
synchrotron radiation photoelectron spectroscopy; photon stimulated desorption (PSD); chemisorption; aromatics; single crystal surfaces;
D O I
10.1016/S0039-6028(01)01691-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The toluene adsorption oil Si(1 1 1)7 x 7 was studied by valence band synchrotron-radiation photoemission at roorn temperature as a function of exposure and time. We found that the adsorption process occurs preferentially on rest atoms and that toluene adsorption is time dependent, since the adsorption features disappear and the rest atoms related feature re-appears as a function of time. The features time evolution is quadratic, hinting at a thermal desorption process. The high desorption rate allows us to rule out a dissociative adsorption involving the methyl group, Our conclusion is that toluene is molecularly pi-bonded through the aromatic electrons on silicon rest atoms. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:186 / 192
页数:7
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