Iridium/silicon capping layer for soft x-ray and extreme ultraviolet mirrors

被引:4
作者
Prisbrey, ST
Vernon, SP
Clift, WM
机构
[1] Univ Calif Davis, Dept Phys, Davis, CA 95616 USA
[2] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
[3] Sandia Natl Labs, Livermore, CA 94551 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2005年 / 23卷 / 06期
关键词
D O I
10.1116/1.2122727
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Iridium terminated silicon spacer layers on Mo/Si multilayer mirrors fabricated by dc magnetron sputtering are investigated for temporal stability. Samples maintained in atmosphere for periods of more than 3000 hours show: Ir terminating layers > 16 angstrom thick are stable, layers with thicknesses between similar to 10 and 16 angstrom are not stable, and thicknesses between -7 and 10 A are stable after a loss m reflectance of similar to 1%. Extreme ultraviolet (EUV) reflectance. atomic force microscopy. sputter Auger electron spectroscopy, and x-ray diffraction measurements indicate that the terminating layer is, in reality, an alloy with graded composition that is Ir rich at the surface. The compositional gradient causes a degradation in reflectance from 66% for Si terminated multilayers to similar to 63% for Ir terminated samples (thickness 18.7 angstrom). A sudden onset of oxidation induced silicon transport for deposited layers of Ir similar to 10-16 angstrom thick produces a degradation in EUV reflectance upon exposure to atmosphere, Accelerated lifetime testing of Si and Ir (18.7 angstrom) terminated multilayer mirrors show a Delta R/R reflectance loss of 0.2% for the Ir terminated sample and similar to 3% for the Sit terminated sample, Further development on Ir terminated multilayer stacks to increase reflectance is needed. (c) 2005 American Vacuum Society.
引用
收藏
页码:2378 / 2383
页数:6
相关论文
共 18 条
[1]   Design and performance of capping layers for EUV multilayer mirrors [J].
Bajt, S ;
Chapman, HN ;
Nguyen, N ;
Alameda, J ;
Robinson, JC ;
Malinowski, M ;
Gullikson, E ;
Aquila, A ;
Tarrio, C ;
Grantham, S .
EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 :236-248
[2]   Improved reflectance and stability of Mo-Si multilayers [J].
Bajt, S ;
Alameda, JB ;
Barbee, TW ;
Clift, WM ;
Folta, JA ;
Kaufmann, B ;
Spiller, EA .
OPTICAL ENGINEERING, 2002, 41 (08) :1797-1804
[3]   Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers [J].
Bajt, S ;
Stearns, DG ;
Kearney, PA .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (02) :1017-1025
[4]   Design and performance of capping layers for extreme-ultraviolet multilayer mirrors [J].
Bajt, SA ;
Chapman, HN ;
Nguyen, N ;
Alameda, J ;
Robinson, JC ;
Malinowski, M ;
Gullikson, E ;
Aquila, A ;
Tarrio, C ;
Grantham, S .
APPLIED OPTICS, 2003, 42 (28) :5750-5758
[5]   POLYCRYSTALLINE INTERLAYER FORMED BY DEPOSITION OF THIN-FILM IRIDIUM ON SILICON [J].
BALLESTEROS, C ;
RODRIGUEZ, T ;
JIMENEZLEUBE, J ;
CLEMENT, M .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (10) :5173-5175
[6]   SOLID-STATE REACTIONS BETWEEN MOSI2 AND IR [J].
CHOU, TC .
SCRIPTA METALLURGICA ET MATERIALIA, 1990, 24 (06) :1131-1136
[7]   Formation of amorphous layers by solid-state reaction from thin Ir films on Si(100) [J].
Demuth, V ;
Strunk, HP ;
Wörle, D ;
Kumpf, C ;
Burkel, E ;
Schulz, M .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 68 (04) :451-455
[8]   FORMATION AND OXIDATION MECHANISMS IN 2 SEMICONDUCTING SILICIDES [J].
DHEURLE, FM .
THIN SOLID FILMS, 1987, 151 (01) :41-50
[9]   LOW EARTH ORBIT ENVIRONMENTAL-EFFECTS ON OSMIUM AND RELATED OPTICAL THIN-FILM COATINGS [J].
GULL, TR ;
HERZIG, H ;
OSANTOWSKI, JF ;
TOFT, AR .
APPLIED OPTICS, 1985, 24 (16) :2660-2665
[10]   Thermal stability of Ir/polycrystalline-Si structure for bottom electrode of integrated ferroelectric capacitors [J].
Jeon, YC ;
Seon, JM ;
Joo, JH ;
Oh, KY ;
Roh, JS ;
Kim, JJ ;
Kim, DS .
APPLIED PHYSICS LETTERS, 1997, 71 (04) :467-469