Structure and Optical properties of RF-Sputtered Mn-ZnO Nanocrystalline Thin Films

被引：2
作者：
Venkaiah, M. [1 ]
Singh, R. [1 ]
机构：
[1] Univ Hyderabad, Sch Phys, Hyderabad 500046, Andhra Pradesh, India
来源：
SOLID STATE PHYSICS: PROCEEDINGS OF THE 55TH DAE SOLID STATE PHYSICS SYMPOSIUM 2010, PTS A AND B | 2011年 / 1349卷
关键词：
Thin film; RF-Sputtering; structure; optical properties;
D O I：
10.1063/1.3606005
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
Zn0.95Mn0.05O thin films were deposited on quartz substrates by radio-frequency magnetron sputtering using ceramic target in pure oxygen gas environment.. The X-ray diffraction and atomic force microscopy (AFM) studies reveal the nanocrysttalline nature of the films. The average grain size of the film is found to increase with increase in process gas pressure. The optical transmission spectra show the films to be highly transparent (80-95%). The direct energy band gap of film decreases from 3.04- 2.92 eV with the increase in working gas pressure,.
引用
收藏
页码：609 / 610
页数：2
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