A complete resistance extraction methodology and circuit models for typical TSV structures

被引:5
|
作者
Chung, Hsien [1 ]
Tu, Che-Min [1 ]
Lwo, Ben-Je [1 ]
Lee, Chih-Yuan [1 ]
机构
[1] Natl Def Univ, Chung Cheng Inst Technol, Tao Yuan 33509, Taiwan
关键词
through silicon via; electrical characteristic tests; electrical circuit model; test pattern design; 3-D integration; SILICON VIAS TECHNOLOGY;
D O I
10.1080/00207217.2012.743079
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Through-silicon via (TSV) is one of the key technologies on three-dimensional integration packaging. In this article, an experimental methodology with circuit models was proposed for electrical characteristic tests on typical TSV structures. To this end, self-developed test patterns such as the via chains, the snake interconnections and the Kelvin structures with different dimensions were designed and manufactured. Suitable electrical measurement methodologies were next employed to characterise the element behaviours of the patterns. Based on the experimental data, electrical circuit models for the TSV structures were introduced and the parameters of the model were exacted. The validity and accuracy of the electrical model were finally verified and the TSV characteristic measurements can be performed through a simpler process.
引用
收藏
页码:1256 / 1269
页数:14
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