Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry -: art. no. 036104

被引:104
作者
Daoulas, KC
Müller, M
Stoykovich, MP
Park, SM
Papakonstantopoulos, YJ
de Pablo, JJ
Nealey, PF
Solak, HH
机构
[1] Univ Gottingen, Inst Theoret Phys, D-37077 Gottingen, Germany
[2] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA
[3] Univ Wisconsin, Dept Chem & Biol Engn, Madison, WI 53706 USA
[4] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
关键词
D O I
10.1103/PhysRevLett.96.036104
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A study is presented of the self-assembly of a lamella-forming blend of a diblock copolymer and its respective homopolymers on periodically patterned substrates consisting of square arrays of spots, that preferentially attract one component, as a function of pattern dimensions and film thickness. The blend morphology follows the pattern at the substrate and forms a single quadratically perforated lamella (QPL). At intermediate film thicknesses necks connect this QPL to the film surface, resulting in a bicontinuous morphology. The necks do not register with the underlying square lattice but exhibit a substantial amount of hexagonal short-range order. For thicker films we observe bicontinuous morphologies consisting of parallel lamellae with disordered perforations. These results demonstrate a promising strategy for the fabrication of complex interfacial nanostructures from two-dimensional chemically patterned templates.
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页数:4
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