Er3+ interlayer energy migration as the limiting photoluminescence quenching factor in nanostructured Er3+:Y2O3 thin films
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作者:
Hoang, J.
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Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Hoang, J.
[1
]
Schwartz, Robert N.
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Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Schwartz, Robert N.
[2
]
Wang, Kang L.
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Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Wang, Kang L.
[2
]
Chang, J. P.
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Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Chang, J. P.
[1
]
机构:
[1] Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
[2] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA
We report the effects of Er3+ nanostructuring on optical properties of heterogeneously doped Er3+:Y2O3 thin films synthesized by radical enhanced atomic layer deposition. By alternating the cycle sequences of Y2O3 and Er2O3, rare earth (RE) ion concentrations were controlled from 4.8 to 11.8 at. % Er and the local Er2O3 thicknesses were varied between 0.7 to 7.6 angstrom. Photoluminescence (PL) was used to examine the 1535 nm (Er I-4(13/2) -> I-4(15/2)) emission at two excitation wavelengths, 488 nm and 976 nm. The normalized PL increased with increasing Er3+ concentrations up to 11.8 and 9.6 at. % under 488 and 976 nm excitations, respectively. The introduction of a local Er2O3 layer greater than 2.4 angstrom resulted in significant PL quenching, over an order of magnitude, under both excitation wavelengths. The quenching was attributed to enhanced local Er3+<-> Er3+ interlayer energy migration. Compared to homogeneously doped RE systems where the RE concentration is directly related to the average RE <-> RE spatial distance, increased luminescence was observed at high Er3+ concentrations in heterogeneously doped systems. These results suggest that controlling the RE proximity is key to engineering the optical properties of RE doped heterogeneous materials. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4737793]
机构:
Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Hoang, J.
Schwartz, Robert N.
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Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Schwartz, Robert N.
Wang, Kang L.
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Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
Wang, Kang L.
Chang, J. P.
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Univ Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Chem & Biomol Engn, Los Angeles, CA 90095 USA
机构:
China Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R ChinaChina Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R China
Zhou, Jun
Chen, Yaqian
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China Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R ChinaChina Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R China
Chen, Yaqian
Lei, Ruoshan
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China Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R ChinaChina Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R China
Lei, Ruoshan
Wang, Huanping
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China Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R ChinaChina Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R China
Wang, Huanping
Xu, Shiqing
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China Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R ChinaChina Jiliang Univ, Inst Optoelect Mat & Devices, Hangzhou 310018, Zhejiang, Peoples R China
机构:
Tokyo Univ Sci, Polyscale Technol Res Ctr, Chiba 2788510, JapanTokyo Univ Sci, Polyscale Technol Res Ctr, Chiba 2788510, Japan
Venkatachalam, Nallusamy
Saito, Yu
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Tokyo Univ Sci, Dept Mat Sci & Technol, Chiba 2788510, JapanTokyo Univ Sci, Polyscale Technol Res Ctr, Chiba 2788510, Japan
Saito, Yu
Soga, Kohei
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Tokyo Univ Sci, Polyscale Technol Res Ctr, Chiba 2788510, Japan
Tokyo Univ Sci, Dept Mat Sci & Technol, Chiba 2788510, JapanTokyo Univ Sci, Polyscale Technol Res Ctr, Chiba 2788510, Japan
机构:
Univ Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USAUniv Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USA
Chandra, Sreerenjini
Deepak, Francis Leonard
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Univ Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USA
Int Iberian Nanotechnol Lab, P-4715 Braga, PortugalUniv Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USA
Deepak, Francis Leonard
Gruber, John B.
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Univ Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USAUniv Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USA
Gruber, John B.
Sardar, Dhiraj K.
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Univ Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USAUniv Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USA
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Yang, Mingzhu
Sui, Yu
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Acad Sinica, Int Ctr Mat Phys, Shenyang 110015, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Sui, Yu
Wang, Shipeng
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Wang, Shipeng
Wang, Xianjie
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Wang, Xianjie
Wang, Yang
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Wang, Yang
Lue, Shuchen
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Harbin Normal Univ, Dept Phys, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Lue, Shuchen
Zhang, Zhiguo
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Zhang, Zhiguo
Liu, Zhiguo
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Liu, Zhiguo
Lue, Tianquan
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Harbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China
Lue, Tianquan
Liu, Wanfa
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机构:
Dalian Inst Chem Phys, Dalian 116023, Peoples R ChinaHarbin Inst Technol, Dept Phys, CCMST, Harbin 150001, Peoples R China