Very high gain millimeter-wave InAlAs/InGaAs/GaAs metamorphic HEMT's

被引:53
作者
Hwang, KC [1 ]
Chao, PC [1 ]
Creamer, C [1 ]
Nichols, KB [1 ]
Wang, S [1 ]
Tu, D [1 ]
Kong, W [1 ]
Dugas, D [1 ]
Patton, G [1 ]
机构
[1] Sanders Lockheed Martin Co, Microwave Space & Mission Elect, Nashua, NH 03061 USA
关键词
D O I
10.1109/55.798040
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the first demonstration of W-band metamorphic HEMT's/LNA MMIC's using an AlGaAsSb lattice strain relief buffer layer on a GaAs substrate. 0.1 x 50 mu m low-noise devices have shown typical extrinsic transconductance of 850 mS/mm with high maximum drain current of 700 mA/mm and gate-drain breakdown voltage of 4.5 V. Small-signal S-parameter measurements performed on the 0.1-mu m devices exhibited an excellent f(T) of 225 GHz and maximum stable gain (MSG) of 12.9 dB at 60 GHz and 10.4 db at 110 GHz. The three-stage W-band LNA MMIC exhibits 4.2 db noise figure with 18 dB gain at 82 GHz and 4.8 dB noise figure with 14 dB gain at 89 GHz. The gain and noise performance of the metamorphic HEMT technology is very close to that of the InP-based HEMT.
引用
收藏
页码:551 / 553
页数:3
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