carbonaceous materials with nanotubes;
hot-filament plasma-enhanced CVD;
plasma surface treatment;
plasma bias and substrate angle effects;
D O I:
10.1016/j.tsf.2005.07.159
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
We have grown carbonaceous materials with nanotubes (CNTs) using a HFPECVD (hot-filament plasma-enhanced chemical vapor deposition) method for the purpose of finding their growth characteristics according to the growth conditions and angles between substrate and cathode. C2H2 gas was used as the carbon precursor and NH3 gas used as the dilution gas. SEM images of Ni-catalyst layers pretreated with NH3 plasma show that nano-size grains were formed, and the diameter as well as the density of CNTs depended on the pretreatment of the catalytic layer. The characteristics of CNTs were supposed to have some relationship with the angle (theta) between substrate and cathode. Raman spectra showed both D-band and G-band peaks around 1360 cm(-1) and 1598 cm(-1) respectively, and the position of these two peaks was not changed with both plasma bias and temperature. However, I-G/I-D, relative intensity ratio decreased with the substrate angle (theta), which indicates that the amounts of amorphous carbon and defective structure in CNTs increased. TEM image showed that CNTs synthesized in this work had multiwall structure and hollow in their body. (c) 2005 Elsevier B.V. All rights reserved.
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Anazawa, K
;
Shimotani, K
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机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Shimotani, K
;
Manabe, C
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h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Manabe, C
;
Watanabe, H
论文数: 0引用数: 0
h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Watanabe, H
;
Shimizu, M
论文数: 0引用数: 0
h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Anazawa, K
;
Shimotani, K
论文数: 0引用数: 0
h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Shimotani, K
;
Manabe, C
论文数: 0引用数: 0
h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Manabe, C
;
Watanabe, H
论文数: 0引用数: 0
h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan
Watanabe, H
;
Shimizu, M
论文数: 0引用数: 0
h-index: 0
机构:
Fuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, JapanFuji Xerox Co Ltd, Corp Res Ctr, Adv Res Lab, Minamiashigara, Kanagawa 2500111, Japan