Transient charging current measurements and modelling in silicon nanocrystal floating gate devices

被引:5
作者
Beaumont, A. [1 ]
Souifi, A. [1 ]
机构
[1] Inst Natl Sci Appl, CNRS, Lab Phys Matiere, F-69621 Villeurbanne, France
关键词
Silicon; Nanocrystals; Transient current; Charging; Flash memory; ELECTRICAL-PROPERTIES; NUCLEATION; SIO2;
D O I
10.1016/j.sse.2008.09.011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nanocrystals-based memories are promising candidates for the scaling of Flash memories in the next decade. However, tools to specify where the carriers are actually stored are still needed in order to optimize the elaboration processes of the nanocrystals. This article presents a model which may be used to extract the physical parameters of the objects in which the carriers are charged. These parameters are extracted from transient current measurements which may be performed by most conventional static ammeters. The model is based on the Study of an equivalent circuit followed by a finite elements analysis of the memory device. This technique has been used to study MOS capacitors containing silicon nanocrystals obtained by annealing LPCVD silicon rich oxide layers. Our model was found to predict all the transient features observed in the current. It quantitatively determined that in average, one electron is charged into 3-5 nm diameter nanocrystals having a density of 0.84-1.5 x 10(12) cm(-2). These parameters are very close to the size and the density which have been targeted during the elaboration process. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:42 / 48
页数:7
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