Photoelectrochemical effect in dye sensitized, sputter deposited Ti oxide films:: The role of thickness-dependent roughness and porosity

被引:23
作者
Gómez, M
Rodríguez, J
Tingry, S
Hagfeldt, A
Lindquist, SE
Granqvist, CG
机构
[1] Univ Uppsala, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden
[2] Univ Grenoble 1, Lab Electrochim Organ & Photochim Redox, CNRS, UMR 5630, F-38401 Grenoble 9, France
[3] Univ Uppsala, Dept Phys Chem, SE-75121 Uppsala, Sweden
关键词
thin films; Ti oxide; solar cells; photoelectric effects; sputtering; electrochemistry;
D O I
10.1016/S0927-0248(99)00044-6
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Ti oxide films were made by reactive DC magnetron sputtering onto electrically conducting glass substrates. The films were dye sensitized with an Ru complex, thereby yielding nanocrystalline solar cells. We investigated the microstructure of the films by X-ray diffraction, scanning electron microscopy, atomic force microscopy, and cyclic voltammetry on viologen-containing samples. The internal surface area was enhanced with increasing film thickness, and this property could be correlated with an enlarged photoelectric conversion efficiency. (C) 1999 Elsevier Science B.V. All rights reserved.
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页码:277 / 287
页数:11
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