Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition

被引：43
|
作者：
Yamada, Takatoshi [1 ]
Ishihara, Masatou
Hasegawa, Masataka
机构：
[1] Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
来源：
THIN SOLID FILMS | 2013年 / 532卷
关键词：
Graphene; Plasma CVD; Roll-to-roll deposition; Coating; Raman spectroscopy; FILMS;
D O I：
10.1016/j.tsf.2012.12.102
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Roll-to-roll microwave plasma chemical vapor deposition (CVD) at low temperature has been developed for the fabrication of a continuous and large area deposition of graphene films for the application of transparent conductive films. Deposition of graphene films on copper (Cu) foils, under methane (CH4) and hydrogen (H-2) plasma below 380 degrees C, were confirmed and characterized by Raman spectroscopy. In addition, the film qualities were improved by controlling the CH4/(CH4+H-2) ratio and the process pressure. The graphene film obtained by roll-to-roll microwave plasma CVD process exhibited uniform Raman spectra towards the width direction of the Cu foil (A4 width). Transmittance and haze of the films were confirmed to be uniform and are in sufficient quality for the use of practical touch panel applications. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：89 / 93
页数：5
相关论文
共 50 条
  • [31] Large area AR coating on plastic substrate using roll to roll methods
    Kleinhempel, Ronny
    Wahl, Andre
    Thielsch, Roland
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S502 - S505
  • [32] Investigation on graphene growth by roll-to-roll chemical vapor deposition卷对卷化学气相沉积法制备石墨烯
    Minghao Liang
    Ling-Xuan Qian
    Yuting Hou
    Jun Li
    Changqing Shen
    Fangzhu Qing
    Xuesong Li
    Science China Materials, 2022, 65 : 1042 - 1048
  • [33] Production of a 100-m-long high-quality graphene transparent conductive film by roll-to-roll chemical vapor deposition and transfer process
    Kobayashi, Toshiyuki
    Bando, Masashi
    Kimura, Nozomi
    Shimizu, Keisuke
    Kadono, Koji
    Umezu, Nobuhiko
    Miyahara, Kazuhiko
    Hayazaki, Shinji
    Nagai, Sae
    Mizuguchi, Yukiko
    Murakami, Yosuke
    Hobara, Daisuke
    APPLIED PHYSICS LETTERS, 2013, 102 (02)
  • [34] Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition
    Kim, Y.
    Song, W.
    Lee, S. Y.
    Jeon, C.
    Jung, W.
    Kim, M.
    Park, C. -Y.
    APPLIED PHYSICS LETTERS, 2011, 98 (26)
  • [35] Low-temperature fabrication of silicon films by large-area microwave plasma enhanced chemical vapor deposition
    Gu, JD
    Chen, PL
    THIN SOLID FILMS, 2006, 498 (1-2) : 14 - 19
  • [36] Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition
    Okigawa, Yuki
    Tsugawa, Kazuo
    Yamada, Takatoshi
    Ishihara, Masatou
    Hasegawa, Masataka
    APPLIED PHYSICS LETTERS, 2013, 103 (15)
  • [37] Synthesis of large area graphene by chemical vapor deposition
    Kawamoto, Nicole
    Berck, Matthew
    Singer, Daniel
    Chen, Michelle
    Luo, Zhengtang
    Johnson, A. T. Charlie
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2010, 240
  • [38] LOW-TEMPERATURE SIC FILM COATING ON METALS BY MICROWAVE-PLASMA CHEMICAL-VAPOR-DEPOSITION
    AOYAMA, S
    SHIBATA, N
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1994, 102 (11): : 1055 - 1059
  • [39] Low temperature growth of graphene using inductively-coupled plasma chemical vapor deposition
    Pekdemir, Sami
    Onses, M. Serdar
    Hancer, Mehmet
    SURFACE & COATINGS TECHNOLOGY, 2017, 309 : 814 - 819
  • [40] Large-area flexible 2D-colloidal crystals produced directly using roll-to-roll processing
    Cagnani, Giovana R.
    Spada, Edna R.
    Cagnani, Leonardo D.
    Torres, Bruno B. M.
    Balogh, Debora T.
    Bardosova, Maria
    Faria, Roberto M.
    COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2020, 588
12345