Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition

被引：43
|
作者：
Yamada, Takatoshi [1 ]
Ishihara, Masatou
Hasegawa, Masataka
机构：
[1] Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
来源：
THIN SOLID FILMS | 2013年 / 532卷
关键词：
Graphene; Plasma CVD; Roll-to-roll deposition; Coating; Raman spectroscopy; FILMS;
D O I：
10.1016/j.tsf.2012.12.102
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Roll-to-roll microwave plasma chemical vapor deposition (CVD) at low temperature has been developed for the fabrication of a continuous and large area deposition of graphene films for the application of transparent conductive films. Deposition of graphene films on copper (Cu) foils, under methane (CH4) and hydrogen (H-2) plasma below 380 degrees C, were confirmed and characterized by Raman spectroscopy. In addition, the film qualities were improved by controlling the CH4/(CH4+H-2) ratio and the process pressure. The graphene film obtained by roll-to-roll microwave plasma CVD process exhibited uniform Raman spectra towards the width direction of the Cu foil (A4 width). Transmittance and haze of the films were confirmed to be uniform and are in sufficient quality for the use of practical touch panel applications. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：89 / 93
页数：5
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