Characteristics of surface acoustic wave convolver in the monolithic metal-zinc oxide-silicon nitride-silicon dioxide-silicon structure

被引:11
|
作者
Panwar, BS [1 ]
机构
[1] Indian Inst Technol, Ctr Appl Res Elect, New Delhi 11006, India
关键词
D O I
10.1063/1.1456264
中图分类号
O59 [应用物理学];
学科分类号
摘要
The nonlinear analysis of the metal-insulator semiconductor shows that the ac currents charging the interface traps lead to large dc operating voltage and an inefficient operation of the monolithic convolvers. These interface traps are annihilated during a low temperature anneal, which utilizes hydrogen atoms implanted underneath the SiO2-Si interface. The overlay piezoelectric ZnO film in the metal-ZnO-Si3N4-SiO2-Si structure is protected from the influx of hydrogen atoms by an interposed silicon nitride layer. Hydrogen implantation and rapid thermal annealing steps are integrated in the process sequence of realizing an efficient metal-ZnO-Si3N4-SiO2-Si monolithic surface acoustic wave convolver. (C) 2002 American Institute of Physics.
引用
收藏
页码:1832 / 1834
页数:3
相关论文
共 50 条
  • [31] CHARACTERISTICS OF ZINC OXIDE SILICON SURFACE-WAVE CONVOLVERS FOR OPTICAL IMAGING AND MEMORY
    ELLIOTT, JK
    GUNSHOR, RL
    PIERRET, RF
    DAVIS, KL
    IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1976, 23 (03): : 200 - 200
  • [32] Room temperature electroluminescence from metal oxide-silicon surface-barrier diode
    Malik, O
    Grimalsky, V
    Torres, A
    De la Hidalga, J
    16TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS, PROCEEDINGS, 2004, : 471 - 474
  • [33] SPECTRAL CHARACTERISTICS OF PHOTOEMISSION FROM SILICON INTO SILICON DIOXIDE IN A METAL-INSULATOR SEMICONDUCTOR STRUCTURE
    KAREVA, GG
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1986, 20 (02): : 211 - 212
  • [34] Charge decay characteristics of silicon-oxide-nitride-oxide-silicon structure at elevated temperatures and extraction of the nitride trap density distribution
    Kim, TH
    Sim, JS
    Lee, JD
    Shim, HC
    Park, BG
    APPLIED PHYSICS LETTERS, 2004, 85 (04) : 660 - 662
  • [35] METAL-NITRIDE-OXIDE-SILICON(MNOS) TRANSISTOR - CHARACTERISTICS AND APPLICATIONS
    FROHMANB.D
    PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1970, 58 (08): : 1207 - +
  • [36] Characteristics of silicon implanted trap memory in oxide-nitride-oxide structure
    Kalkur, TS
    Peachey, N
    Moss, T
    SILICON MATERIALS-PROCESSING, CHARACTERIZATION AND RELIABILITY, 2002, 716 : 203 - 208
  • [37] SURFACE ACOUSTIC-WAVE PROPERTIES OF BISMUTH SILICON-OXIDE
    VETELINO, JF
    JHUNJHUNWALA, A
    FIELD, JC
    IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1978, 25 (04): : 251 - 251
  • [38] ZINC OXIDE SILICON MEMORY ARRAY WITH OPTICAL OR ELECTRICAL WRITING AND ACOUSTIC SURFACE-WAVE READOUT
    COLDREN, LA
    IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1976, 23 (03): : 201 - 201
  • [39] EVALUATION OF RELATIVELY HIGH SURFACE STATE DENSITIES IN METAL-(THERMAL) OXIDE-SILICON STRUCTURES
    COURAT, JP
    NUZILLAT, G
    SIXOU, P
    SOLID STATE COMMUNICATIONS, 1969, 7 (16) : 1123 - +
  • [40] Surface potential dependence of interface state passivation in metal-tunnel oxide-silicon diodes
    Andersson, M.O.
    Lundgren, A.
    Lundgren, P.
    Journal of Non-Crystalline Solids, 1995, 187