Defect formation and crystallization in a-Si:H induced by Si+ implantation

被引:0
作者
Golikova, OA [1 ]
Bogdanova, EV
Kuznetsov, AN
Domashevskaya, EP
Terekhov, VA
Rahimov, NR
Mavlyanov, KY
机构
[1] Ioffe Inst, Lab Phys Semiconducting Devices, St Petersburg 194021, Russia
[2] Voronezh State Univ, Dept Solid State, Voronezh 394693, Russia
[3] Namangan State Univ, Dept Tech & Phys, Namagan 716019, Uzbekistan
关键词
D O I
10.1016/S0022-3093(02)00938-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effects of Si+ keV-ion implantation on the a-Si:H film structure and electronic parameters have been investigated. It is shown how defect formation in the films and their crystallization after the implantation depend on the initial material characteristics: Fermi level position. deposition-induced defect density, SiH bonding, disorder degree and nanocrystalline inclusions in an amorphous matrix. (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码:783 / 787
页数:5
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