Voluminous high-density plasma generator based on high-current pulsed magnetron discharge

被引：0

作者：

Kozyrev, A. V. ^{[1
]}

Sochugov, N. S. ^{[2
]}

Zakharov, A. N. ^{[1
]}

Oskirko, V. O. ^{[2
]}

Semenov, V. A. ^{[1
]}

Semenyuk, N. S. ^{[1
]}

机构：

[1] Natl Res Tomsk State Univ, Tomsk, Russia

[2] Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia

来源：

RUSSIAN PHYSICS JOURNAL | 2012年 / 55卷 / 02期

关键词：

magnetron sputtering system; magnetron discharge; treatment by plasma immersion;

D O I：

10.1007/s11182-012-9795-4

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Results of investigations into the spatial and temporal parameters of the voluminous plasma generated by two high-current pulsed magnetron sputtering systems operating in balanced and unbalanced regimes are presented. It is demonstrated that the plasma filling the vacuum chamber comprises two components: the plasma drifting from the region of magnetron magnetic traps and the plasma generated by oscillating electrons directly in the chamber volume. For the balanced magnetron magnetic field configuration, the plasma in the centre of the vacuum chamber with volume of similar to 10 L has concentration of (1-2)a <...10(13) cm(-3) for magnetron discharge current amplitude of 350 A. The application of the unbalanced magnetic field configuration allows the plasma concentration in the central part of the vacuum chamber to be increased to similar to 6a <...10(13) cm(-3).

引用

页码：195 / 201

页数：7

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