Influence of Extended Defects on Optoelectronic and Electronic Nitride Devices

被引:0
|
作者
Moustakas, Theodore D. [1 ]
机构
[1] Boston Univ, Dept Elect & Comp Engineer, Div Mat Sci & Engn, Photon Ctr, Boston, MA 02215 USA
关键词
III-Nitride devices; surface states; dislocations; stacking faults; potential fluctuations; EPITAXIAL-GROWTH; PHASE-SEPARATION; FILMS; DISLOCATION; SURFACE; ALLOYS; LUMINESCENCE; SCATTERING; EFFICIENCY;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Extended defects (dislocations, stacking faults, phase separation and alloy ordering), although are abundant in Nitride semiconductors, they do not influence the performance of minority carrier devices (LEDs, lasers, solar cells etc.) to the same degree as they do in traditional III-V compounds. On the other hand they have a stronger effect on the performance of electronic devices (FETs, BJT etc.). In this paper I am addressing the formation of extended defects and the origins of their abundance. Furthermore, I discuss the fundamental differences between nitride semiconductors and traditional III-V compounds, which lead to the insensitivity in the performance of nitride optoelectronic devices to the concentration of extended defects. The influence of these defects on electronic devices is also discussed.
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页数:4
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