Reaction scheme of ammonia synthesis in the ECR plasmas

被引:41
作者
Kiyooka, H [1 ]
Matsumoto, O [1 ]
机构
[1] AOYAMA GAKUIN UNIV,DEPT CHEM,SETAGAYA KU,TOKYO 157,JAPAN
关键词
iron catalyst; ECR plasmas; XPS; ammonia;
D O I
10.1007/BF01447008
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The reaction scheme of ammonia synthesis in the ECR plasma apparatus was investigated from both identifications of the species in the plasmas and the adsorbed species on the surface of a steel substrate placed in the plasmas. The adsorbed species were considerably different when different kinds of plasmas are used. NHx species were adsorbed on the steel substrate surface in the nitrogen-hydrogen plasma, and N-2 molecules were adsorbed in the nitrogen plasma. By the application of a negative bias potential on the substrate, the adsorption of N atom or Fe-N bond formation was identified on the steel substrate surface. When the stainless steel wall of the chamber was covered with aluminum foil, the yield of NHx radicals, which were on both the substrate and in the plasma, decreased. By exposure of the substrate, on which N-2 molecules or N atoms adsorbed, to the hydrogen plasma, N-2 and N disappeared from the steel substrate surface, forming ammonia. Moreover, the adsorption of NHx radicals disappeared when the stainless steel wall surface was covered with aluminum foil. Thus, the surface of the stainless steel wall acts as a catalyst in ammonia formation. The formation of ammonia in the nitrogen-hydrogen ECR plasma, in which the steel substrate served as the catalyst, is nor only through the dissociative adsorption of excited nitrogen molecules but also through the dissociative adsorption of nitrogen molecular ions.
引用
收藏
页码:547 / 562
页数:16
相关论文
共 17 条
[1]   PLASMA SYNTHESIS OF AMMONIA IN PRESENCE OF AN IRON CATALYST [J].
BOTCHWAY, GY ;
VENUGOPALAN, M .
ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-WIESBADEN, 1980, 120 (01) :103-110
[2]  
EREMIN EN, 1975, RUSS J PHYS CHEM, V49, P1113
[3]   XPS STUDIES WITH AMMONIA-SYNTHESIS CATALYSTS [J].
ERTL, G ;
THIELE, N .
APPLIED SURFACE SCIENCE, 1979, 3 (01) :99-112
[4]  
ERTL G, 1988, SUCCESSFUL DESIGN CA, P351
[5]   DEPOSITION SCHEME OF TRANSPARENT AND SEMICONDUCTING POLYMER-FILMS FROM METHANE PLASMA-PREPARED USING ECR APPARATUS [J].
FUJITA, T ;
INAGAKI, C ;
UYAMA, H ;
MATSUMOTO, O .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (05) :1645-1647
[6]  
FUJITA T, 1989, J ELECTROCHEM SOC, V136, P1645
[7]   PI-BONDED N-2 ON FE(111) - THE PRECURSOR FOR DISSOCIATION [J].
GRUNZE, M ;
GOLZE, M ;
HIRSCHWALD, W ;
FREUND, HJ ;
PULM, H ;
SEIP, U ;
TSAI, MC ;
ERTL, G ;
KUPPERS, J .
PHYSICAL REVIEW LETTERS, 1984, 53 (08) :850-853
[8]  
MATSUMOTO O, 1993, P 11 INT S PLASM CHE, P1063
[9]  
Nomura O., 1983, Proceedings of 6th Internation Symposium on Plasma Chemistry., P681
[10]  
NOMURA O, 1981, SCI PAPERS IPCR, V75, P124