Effects of Ge profile in base region on thermal characteristics of SiGe HBTs

被引:6
作者
Zhao Xin [1 ]
Zhang Wan-Rong [1 ]
Jin Dong-Yue [1 ]
Fu Qiang [1 ]
Chen Liang [1 ]
Xie Hong-Yun [1 ]
Zhang Yu-Jie [1 ]
机构
[1] Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
基金
中国国家自然科学基金;
关键词
SiGe Heterojunction bipolar transistor (HBT); thermal stability; Ge-profile; SILVACO; BAND;
D O I
10.7498/aps.61.134401
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
As is well known, the base Ge composition can improve the DC characteristics, frequency characteristics and noise characteristics of SiGe HBTs. However, the reports about the effects of Ge profile on HBTs thermal characteristics are rare. In this paper, by use of SILVACO simulator, the effects of different Ge gradients on thermal and electrical characteristics of SiGe HBT are investigated. It is found that under the same total Ge amount condition, as Ge gradient increases, the f(T) of device increases significantly, the uniformity of temperature distribution becomes better, the influences of temperature on the beta and f(T) are weakened, but the gain beta becomes smaller. For the device with uniform Ge composition, the beta is high, but the influence of temperature on the beta is enormous, the uniformity of temperature distribution is poor. Based on these results, in order to make a tradeoff among thermal, gain and frequency characteristics, a novel Ge composition structure with the combination of the uniform and graded Ge composition is proposed. The results show that the novel Ge composition structure SiGe HBT has good performances lower peak temperature, better uniform temperature profile, smaller variabilities of beta and f(T) with temperature, sufficient high beta and f(T) compared with the uniform Ge composition device. These new results provide valuable reference for the device thermal design, and are supplemental to the research and application of SiGe HBTs.
引用
收藏
页数:7
相关论文
共 10 条
[1]   Base-profile optimization for minimum noise figure in advanced UHV/CVD SiGe HBT's [J].
Ansley, WE ;
Cressler, JD ;
Richey, DM .
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1998, 46 (05) :653-660
[2]  
Chen L, 2011, CHINESE PHYS B, V20
[3]   Improvement on thermal stability of power heterojunction bipolar transistor using non-uniform finger spacing [J].
Chen Liang ;
Zhang Wan-Rong ;
Jin Dong-Yue ;
Xie Hong-Yun ;
Xiao Ying ;
Wang Ren-Qing ;
Ding Chun-Bao .
ACTA PHYSICA SINICA, 2011, 60 (07)
[4]   An exploration of substrate coupling at K-band between a SiGe HBT power amplifier and a SiGe HBT voltage-controlled-oscillator [J].
Comeau, Jonathan P. ;
Najafizadeh, Laleh ;
Andrews, Joel M. ;
Prakash, A. P. Gnana ;
Cressler, John D. .
IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2007, 17 (05) :349-351
[5]  
Ma L, 2009, CHINESE PHYS B, V18, P303, DOI 10.1088/1674-1056/18/1/049
[6]  
Rahim A F A, 2002, IEEE INT C SEM EL P, V2, P365
[7]   Optimum Ge profile for base transit time minimization of SiGe HBT [J].
Song, J ;
Yuan, JS .
SOLID-STATE ELECTRONICS, 1997, 41 (12) :1957-1959
[8]  
Wang Daqiang, 1999, Research & Progress of SSE, V19, P190
[9]   Effect of bandgap engineering on thermal characteristic of radio frequency power SiGe heterojunction bipolar transistor [J].
Xiao Ying ;
Zhang Wan-Rong ;
Jin Dong-Yue ;
Chen Liang ;
Wang Ren-Qing ;
Xie Hong-Yun .
ACTA PHYSICA SINICA, 2011, 60 (04)
[10]   Investigation of the impact of band offset perturbations on the performance of abrupt HBT with heavily doped base [J].
Zhou Shou-Li ;
Huang Hui ;
Huang Yong-Qing ;
Ren Xiao-Min .
ACTA PHYSICA SINICA, 2007, 56 (05) :2890-2894