Silicon detectors with 3-D electrode arrays: Fabrication and initial test results

被引:125
作者
Kenney, C [1 ]
Parker, S
Segal, J
Storment, C
机构
[1] Univ Hawaii, Honolulu, HI 96822 USA
[2] Stanford Univ, Stanford Nanofabricat Facil, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
active edges; semiconductor detectors; silicon detectors; three-dimensional;
D O I
10.1109/23.785737
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The first three-dimensional detectors with n and p electrodes that penetrate through the silicon substrate have been fabricated. Some expected properties, including low depletion voltages, wide voltage plateaus before leakage current limits are reached, and rapid charge collection are re,ie,red. Fabrication steps and initial test results for leakage currents and infrared signal detection are covered. The authors conclude with a description of current work, including fabrication of active-edge detectors, ones with sensitive areas that should extend to their physical edge.
引用
收藏
页码:1224 / 1236
页数:13
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