Characterization of Alq3 thin films by a near-field microwave microprobe

被引：3

作者：

Hovsepyan, Artur ^{[1
,2
]}

Lee, Huneung ^{[1
,2
]}

Sarpyan, Tigran ^{[1
,2
]}

Melikyan, Harutyun ^{[1
,2
]}

Yoon, Youngwoon ^{[1
,2
]}

Babajanyan, Arsen ^{[1
,2
]}

Friedman, Barry ^{[3
]}

Lee, Kiejin ^{[1
,2
]}

机构：

[1] Sogang Univ, Dept Phys, Seoul 121742, South Korea

[2] Sogang Univ, Interdisciplinary Program Integrated Biotechnol, Seoul 121742, South Korea

[3] Sam Houston State Univ, Dept Phys, Huntsville, TX 77341 USA

来源：

ULTRAMICROSCOPY | 2008年 / 108卷 / 10期

关键词：

near field; microwave microprobe; Alq3; heating; absorption;

D O I：

10.1016/j.ultramic.2008.04.013

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

We observed tris-8-hydroxyquinoline aluminum (Alq3) thin films dependence on Substrate heating temperatures by using a near-field microwave microprobe (NFMM) and by optical absorption at wavelengths between 200 and 900nm. The changes of absorption intensity at different Substrate heating temperatures are correlated to the changes in the sheet resistance of Alq3 thin films. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1058 / 1061

页数：4

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