Device simulation for advanced Si1-xGexHBTs

被引:10
作者
Mastrapasqua, M [1 ]
Pacelli, A [1 ]
Palestri, P [1 ]
King, CA [1 ]
机构
[1] Agere Syst, Murray Hill, NJ 07974 USA
来源
PROCEEDINGS OF THE 2001 BIPOLAR/BICMOS CIRCUITS AND TECHNOLOGY MEETING | 2001年
关键词
D O I
10.1109/BIPOL.2001.957854
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Accurate simulations of advanced Si1-x Ge-x heterojunction bipolar transistors involve a range of different problems, whose solution demands different numerical approaches. In our simulation methodology, the complexity of each numerical method matches that of the problem at hand. We employ a 2D drift-diffusion solver for dc and ac characteristics, ID full-band Monte Carlo for transport in the base-collector high electric field region, and a 3D heat-transport solver for device selfheating. Extrinsic parasitics are introduced as lumped circuit elements whose values are obtained from measurements. This approach not only reduces the computational cost of the simulation, but it also helps to differentiate the relevance of the intrinsic and extrinsic device parameters. Such information can then be used for device optimization and for guidance in generating compact models.
引用
收藏
页码:42 / 51
页数:10
相关论文
共 49 条
  • [1] [Anonymous], IEEE IEDM
  • [2] ASHEGHI M, 1999, INT SOI C, P28
  • [3] A physics-based dynamic thermal impedance model for vertical bipolar transistors on SOI substrates
    Brodsky, JS
    Fox, RM
    Zweidinger, DT
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (12) : 2333 - 2339
  • [4] PHASE-SPACE SIMPLEX MONTE-CARLO FOR SEMICONDUCTOR TRANSPORT
    BUDE, J
    SMITH, RK
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1994, 9 (05) : 840 - 843
  • [5] IMPACT IONIZATION AND DISTRIBUTION-FUNCTIONS IN SUBMICRON NMOSFET TECHNOLOGIES
    BUDE, JD
    MASTRAPASQUA, M
    [J]. IEEE ELECTRON DEVICE LETTERS, 1995, 16 (10) : 439 - 441
  • [6] Monte Carlo simulation of the CHISEL flash memory cell
    Bude, JD
    Pinto, MR
    Smith, RK
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2000, 47 (10) : 1873 - 1881
  • [7] Explanation of stress-induced damage in thin oxides
    Bude, JD
    Weir, BE
    Silverman, PJ
    [J]. INTERNATIONAL ELECTRON DEVICES MEETING 1998 - TECHNICAL DIGEST, 1998, : 179 - 182
  • [8] Low- and high-field electron-transport parameters for unstrained and strained Si1-xGex
    Bufler, FM
    Graf, P
    Meinerzhagen, B
    Adeline, B
    Rieger, MM
    Kibbel, H
    Fischer, G
    [J]. IEEE ELECTRON DEVICE LETTERS, 1997, 18 (06) : 264 - 266
  • [9] CONG HI, 2001, ISSCC, P80
  • [10] MEASURING AND MODELING MINORITY-CARRIER TRANSPORT IN HEAVILY DOPED SILICON
    DELALAMO, J
    SWIRHUN, S
    SWANSON, RM
    [J]. SOLID-STATE ELECTRONICS, 1985, 28 (1-2) : 47 - 54