Synthesis and optical properties of tantalum oxide films prepared by ionized plasma-assisted pulsed laser deposition

被引：20

作者：

He, Xiliang ^{[1
,2
]}

Wu, Jiehua ^{[3
]}

Zhao, Lili ^{[3
]}

Meng, Jia ^{[3
]}

Gao, Xiangdong ^{[1
]}

Li, Xiaomin ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfin M, Shanghai 200050, Peoples R China

[2] Chinese Acad Sci, Grad Sch, Shanghai 200050, Peoples R China

[3] Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Coating Mat, Shanghai 200050, Peoples R China

来源：

SOLID STATE COMMUNICATIONS | 2008年 / 147卷 / 3-4期

基金：

中国国家自然科学基金;

关键词：

tantalum oxide films; ionized plasma-assisted pulsed laser deposition; optical properties;

D O I：

10.1016/j.ssc.2008.05.007

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

In this work, tantalum oxide (TaOx) films were deposited on quartz glass substrates by pulsed laser deposition (PLD) and ionized plasma-assisted pulsed laser deposition (IPA-PLD). The effects of oxygen pressures and ionized oxygen plasma-assistance (IOPA) on the optical properties of deposited films have been studied. Ultraviolet-visible-near infrared (UV-VIS-NIR) scanning spectrophotometry was used to measure the transmittance of deposited films and to determine the optical band gap and absorption coefficient. Results show that the transmittance, absorption coefficient, band gap and chemical composition of deposited films reveal a strong dependence on the oxygen pressures and IOPA. Under optimum condition of IOPA, the refractive index of the synthesized film was 2.22 (at 633 nm wavelength), while an optical band gap of 4.18 eV was obtained. These two values compare very favorably with films produced by other methods. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：90 / 93

页数：4

共 24 条

[1] Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications [J].