Four-probe electrical-transport measurements on single indium tin oxide nanowires between 1.5 and 300 K

被引:33
作者
Chiu, Shao-Pin [1 ]
Chung, Hui-Fang [2 ]
Lin, Yong-Han [3 ]
Kai, Ji-Jung [2 ]
Chen, Fu-Rong [2 ]
Lin, Juhn-Jong [1 ,3 ]
机构
[1] Natl Chiao Tung Univ, Inst Phys, Hsinchu 30010, Taiwan
[2] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 30013, Taiwan
[3] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 30010, Taiwan
关键词
SN-DOPED IN2O3; WEAK-LOCALIZATION; FILMS; SUPERCONDUCTIVITY; RESISTIVITY; ALLOYS;
D O I
10.1088/0957-4484/20/10/105203
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Single-crystalline indium tin oxide (ITO) nanowires (NWs) were grown by the standard thermal evaporation method. The as-grown NWs were typically 100-300 nm in diameter and a few mu m long. Four-probe submicron Ti/Au electrodes on individual NWs were fabricated by the electron-beam lithography technique. The resistivities of several single NWs have been measured from 300 down to 1.5 K. The results indicate that the as-grown ITO NWs are metallic, but disordered. The overall temperature behavior of resistivity can be described by the Bloch-Gruneisen law plus a low-temperature correction due to the scattering of electrons off dynamic point defects. This observation suggests the existence of numerous dynamic point defects in as-grown ITO NWs.
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页数:7
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