The effect of sequential chemical treatment on the room temperature electrical resistance of sub-micron-thick poly(3,4-ethylenedioxythiophene):poly(styrene sulphonate) (PEDOT:PSS) films was studied. The resistance of PEDOT:PSS films was found to be highly dependent on the molar concentration, type of solvent and number of successive treatments. An effective decrease in the resistance value from-415 omega to-35 omega was achieved upon successive treatments of pristine film twice with dimethyl sulfoxide and one time with 0.5 M sulfuric acid. Interestingly, the resistance of the film was found to depend on the sequence of the successive treatment of both the solvents. The appearance of sharp peak in XRD after acid treatment suggests enhancement in the crystallinity of the PEDOT:PSS films. Raman spectroscopy was employed to monitor the structural changes (coil to extended linear coil conformation) that results in an improvement in the conductance of the treated films.
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New York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, Old Westbury, NY 11568 USANew York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, Old Westbury, NY 11568 USA
Kohler, Michael C.
Li, Fang
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New York Inst Technol, Dept Mech Engn, Coll Engn & Comp Sci, Old Westbury, NY 11568 USANew York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, Old Westbury, NY 11568 USA
Li, Fang
Dong, Ziqian
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New York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, New York, NY 10023 USANew York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, Old Westbury, NY 11568 USA
Dong, Ziqian
Amineh, Reza K.
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New York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, New York, NY 10023 USANew York Inst Technol, Coll Engn & Comp Sci, Dept Elect & Comp Engn, Old Westbury, NY 11568 USA
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Univ Delaware, Mat Sci & Engn, Newark, DE 19716 USA
Univ Delaware, Adv Mat Characterizat Lab, Interdisciplinary Sci & Engn Lab 151, Newark, DE 19716 USAUniv Delaware, Mat Sci & Engn, Newark, DE 19716 USA
Qu, Jing
Garabedian, Nikolay
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Univ Delaware, Mech Engn, Newark, DE 19716 USAUniv Delaware, Mat Sci & Engn, Newark, DE 19716 USA
Garabedian, Nikolay
Burris, David L.
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Univ Delaware, Mech Engn, Newark, DE 19716 USA
Univ Delaware, Biomed Engn, Newark, DE 19716 USAUniv Delaware, Mat Sci & Engn, Newark, DE 19716 USA
Burris, David L.
Martin, David C.
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Univ Delaware, Mat Sci & Engn, Newark, DE 19716 USA
Univ Delaware, Biomed Engn, Newark, DE 19716 USAUniv Delaware, Mat Sci & Engn, Newark, DE 19716 USA