Reduction in the resistance of poly(3,4-ethylenedioxythiophene):poly (styrene sulphonate) (PEDOT:PSS) films by sequential chemical treatment

被引:1
|
作者
Sharma, Meenu [1 ]
Sameera, I. [1 ]
Bhatia, Ravi [1 ]
机构
[1] Guru Jambheshwar Univ Sci & Technol, Dept Phys, Hisar 125001, India
关键词
Electrical resistance; Conducting polymers; Raman spectroscopy; ELECTRODE;
D O I
10.1016/j.ssc.2022.115008
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The effect of sequential chemical treatment on the room temperature electrical resistance of sub-micron-thick poly(3,4-ethylenedioxythiophene):poly(styrene sulphonate) (PEDOT:PSS) films was studied. The resistance of PEDOT:PSS films was found to be highly dependent on the molar concentration, type of solvent and number of successive treatments. An effective decrease in the resistance value from-415 omega to-35 omega was achieved upon successive treatments of pristine film twice with dimethyl sulfoxide and one time with 0.5 M sulfuric acid. Interestingly, the resistance of the film was found to depend on the sequence of the successive treatment of both the solvents. The appearance of sharp peak in XRD after acid treatment suggests enhancement in the crystallinity of the PEDOT:PSS films. Raman spectroscopy was employed to monitor the structural changes (coil to extended linear coil conformation) that results in an improvement in the conductance of the treated films.
引用
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页数:4
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