Robust design of broadband EUV multilayer using multi-objective evolutionary algorithm

被引：12
作者：
Kuang, Shang-qi [1 ]
Gong, Xue-peng [2 ]
Yang, Hai-gui [3 ]
机构：
[1] Changchun Univ Sci & Technol, Sch Sci, Changchun 130022, Jilin, Peoples R China
[2] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Appl Opt, Changchun 130033, Jilin, Peoples R China
[3] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Opt Syst Adv Mfg Technol, Changchun 130033, Jilin, Peoples R China
来源：
OPTICS COMMUNICATIONS | 2018年 / 410卷
基金：
中国国家自然科学基金;
关键词：
Multilayers; Multilayer design; X-ray; Soft X-rays; Extreme ultraviolet; Thin films; X-RAY; GENETIC ALGORITHM; MIRRORS; FABRICATION; REFLECTIVITY; OPTIMIZATION; COATINGS;
D O I：
10.1016/j.optcom.2017.11.045
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Considering the random fluctuations of the layer thickness, a method of robust design of broadband EUV multilayers based on multi-objective evolutionary algorithm is presented. Owing to the optimization of multiobjective evolutionary algorithm, the optical performance and robust quality of broadband Mo/Si multilayer can be optimized simultaneously, and then a set of robust designs of aperiodic EUV multilayers, which are insensitive to the thickness errors can be obtained in one single simulation run. The robust designs of broadband Mo/Si multilayers could be used to reduce the production risks of EUV mirrors, and this research demonstrates a great potential of application of multi-objective evolutionary algorithm on the design of optical thin film. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码：805 / 810
页数：6
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