Epitaxial growth of Cu on Ag(111) studied with angle-resolved photoemission spectroscopy

被引:1
作者
Luh, Dah-An [1 ,2 ]
Huang, Chih-Hao [1 ]
Cheng, Cheng-Maw [2 ]
Tsuei, Ku-Ding [2 ]
机构
[1] Natl Cent Univ, Dept Phys, Taoyuan 32001, Taiwan
[2] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
关键词
Epitaxial growth; Metallic thin films; Cu; Ag(111); ARPES; Surface state;
D O I
10.1016/j.apsusc.2014.12.123
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth of Cu on Ag(1 1 1) under varied growth conditions was investigated with angle-resolved photoemission spectra. The evolution of Cu/Ag( 1 1 1) during annealing was characterized on monitoring its surface states. The surface morphology of a Cu film on Ag( 1 1 1) depends on the temperature and the Cu coverage. Islands or crystalline films develop when Cu is deposited at 300 K. Defects in the Cu films penetrate deeply into the Ag( 1 1 1) substrate and expose the Ag( 1 1 1) surface. The deposition of Cu at a low temperature results in disordered films. On annealing, the films become ordered with defects. Our results show the segregation of Ag on the Cu surface, which occurs at 300 K and becomes accelerated significantly at 380 K. After being annealed above 430 K, all islands and films of Cu are fully covered with Ag, showing a (9 x 9) reconstruction. Our results indicate also that the segregation of Ag on the Cu surface occurs only after the Ag( 1 1 1) surface is exposed, indicating that Ag atoms migrate to the Cu(1 1 1) surface, not through bulk Cu, but along the walls of the islands and the defects in the films. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:235 / 239
页数:5
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