On the mechanism of material removal by fixed abrasive lapping of various glass substrates
被引:50
作者:
Cho, Young-Jun
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Hanyang Univ, Dept Bionano Technol, Ansan, South KoreaHanyang Univ, Dept Bionano Technol, Ansan, South Korea
Cho, Young-Jun
[1
]
Kim, Hyuk-Min
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Hanyang Univ, Dept Bionano Technol, Ansan, South KoreaHanyang Univ, Dept Bionano Technol, Ansan, South Korea
Kim, Hyuk-Min
[1
]
Manivannan, R.
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机构:
Hanyang Univ, Dept Mat Engn, Ansan, South KoreaHanyang Univ, Dept Bionano Technol, Ansan, South Korea
Manivannan, R.
[2
]
Moon, Deog-Ju
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Hanyang Univ, Dept Bionano Technol, Ansan, South KoreaHanyang Univ, Dept Bionano Technol, Ansan, South Korea
Moon, Deog-Ju
[1
]
Park, Jin-Goo
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Hanyang Univ, Dept Bionano Technol, Ansan, South Korea
Hanyang Univ, Dept Mat Engn, Ansan, South KoreaHanyang Univ, Dept Bionano Technol, Ansan, South Korea
Park, Jin-Goo
[1
,2
]
机构:
[1] Hanyang Univ, Dept Bionano Technol, Ansan, South Korea
[2] Hanyang Univ, Dept Mat Engn, Ansan, South Korea
Glass ceramics are one of the important materials for optoelectronic devices. Fixed abrasive, double-sided lapping parameters (time, pressure, and platen speed) were optimized using borofloat, BK7 and quartz substrates. Lapping of borofloat, BK7 and quartz substrates were performed at optimized conditions. The removal rate was found to be highest in the case of borofloat, followed by quartz and BK7. The removal rate trend could not be explained based on the hardness of the material because quartz shows higher removal rate in spite of its higher hardness when compared to the BK7 substrate. The glass substrate forms a hydrated layer when it is exposed to an aqueous environment, and that depends on the composition of the substrate. The hardness of the material decreases significantly in the aqueous environment due to the formation of a hydration layer. The formation of a hydration layer is thought to facilitate faster and easier penetration of diamond abrasive into the substrate. Penetration then results in brittle fracture and the formation of lumps of debris. (C) 2012 Elsevier B.V. All rights reserved.
机构:
Huaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
Liverpool John Moores Univ, Fac Engn & Technol, Liverpool, Merseyside, EnglandHuaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
Tian, Zige
Chen, Xun
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Liverpool John Moores Univ, Fac Engn & Technol, Liverpool, Merseyside, EnglandHuaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
Chen, Xun
Xu, Xipeng
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机构:
Huaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R ChinaHuaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
机构:
Huaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
Liverpool John Moores Univ, Fac Engn & Technol, Liverpool, Merseyside, EnglandHuaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
Tian, Zige
Chen, Xun
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h-index: 0
机构:
Liverpool John Moores Univ, Fac Engn & Technol, Liverpool, Merseyside, EnglandHuaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China
Chen, Xun
Xu, Xipeng
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机构:
Huaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R ChinaHuaqiao Univ, Inst Mfg Engn, Xiamen, Fujian, Peoples R China