Shortwave projection nanolithography

被引:9
作者
Salashchenko, N. N.
Chkhalo, N. I.
机构
基金
俄罗斯基础研究基金会;
关键词
D O I
10.1134/S1019331608030155
中图分类号
N09 [自然科学史]; B [哲学、宗教];
学科分类号
01 ; 0101 ; 010108 ; 060207 ; 060305 ; 0712 ;
摘要
The article below is dedicated to research into nanolithography in the ultrashort spectral region that was conducted at the RAS Institute for Physics of Microstructures and discussed at an RAS Presidium meeting. These findings, according to the participants in the meeting, can actually be used to revive the Russian microelectronic industry.
引用
收藏
页码:279 / 285
页数:7
相关论文
共 31 条
[1]  
Andreev S. S., 2003, Poverhnost, VN2, P6
[2]   Multilayer optics for XUV spectral region: technology fabrication and applications [J].
Andreev, SS ;
Akhsakhalyan, AD ;
Bibishkin, MA ;
Chkhalo, NI ;
Gaponov, SV ;
Gusev, SA ;
Kluenkov, EB ;
Prokhorov, KA ;
Salashchenko, NN ;
Schafers, F ;
Zuev, SY .
CENTRAL EUROPEAN JOURNAL OF PHYSICS, 2003, 1 (01) :191-209
[3]  
*ASML, PROD LITH TWINSCAN X
[4]   MOLYBDENUM-SILICON MULTILAYER MIRRORS FOR THE EXTREME ULTRAVIOLET [J].
BARBEE, TW ;
MROWKA, S ;
HETTRICK, MC .
APPLIED OPTICS, 1985, 24 (06) :883-886
[5]  
Bibishkin M. S., 2005, P S NAN NAN NIZHN NO, V2, P479
[6]  
BIBISHKIN MS, 2006, P S NAN NAN NIZHN NO, V2, P358
[7]   PMMA-based resists for a spectral range near 13 nm [J].
Bulgakova, SA ;
Lopatin, AY ;
Luchin, VI ;
Mazanova, LM ;
Molodnjakov, SA ;
Salashchenko, NN .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2000, 448 (1-2) :487-492
[8]  
DIJSSELDONK A, 2006, NANOCMOS PULLNANO MO
[9]  
ENDO A, 2006, SEMATECH 2006 EUVL S
[10]  
FOMENKOV IV, 2006, SEMATECH 2006 EUVL S