Epitaxial graphene/Ge interfaces: a minireview

被引:23
作者
Dedkov, Yuriy [1 ,2 ]
Voloshina, Elena [1 ,2 ]
机构
[1] Shanghai Univ, Dept Phys, Shanghai 200444, Peoples R China
[2] Southern Fed Univ, Inst Phys & Organ Chem, Rostov Na Donu 344090, Russia
基金
中国国家自然科学基金;
关键词
CVD GRAPHENE; HYDROGEN INTERCALATION; ELECTRONIC-STRUCTURE; MONOLAYER GRAPHENE; TUNABLE GRAPHENE; DIRECT GROWTH; HIGH-QUALITY; LAYER; SILICON; GE(001);
D O I
10.1039/d0nr00185f
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The recent discovery of the ability to perform direct epitaxial growth of graphene layers on semiconductor Ge surfaces led to a huge interest in this topic. One of the reasons for this interest is the chance to overcome several present-day drawbacks on the method of graphene integration in modern semiconductor technology. The other one is connected with the fundamental studies of the new graphene-semiconductor interfaces that might help with the deeper understanding of mechanisms, which governs graphene growth on different substrates as well as shedding light on the interaction of graphene with these substrates, whose range is now spread from metals to insulators. The present minireview gives a timely overview of the state-of-the-art field of studies of the graphene-Ge epitaxial interfaces and draws some conclusions in this research area.
引用
收藏
页码:11416 / 11426
页数:11
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