Model for interpretation and correlation of contact angle measurements

被引：6
作者：
Civan, F
机构：
[1] Sch. of Petrol. and Geol. Eng., University of Oklahoma, T301 Energy Center, Norman, OK 73019
来源：
JOURNAL OF COLLOID AND INTERFACE SCIENCE | 1997年 / 192卷 / 02期
关键词：
contact angle; surface cleaning; modeling; correlation;
D O I：
10.1006/jcis.1997.4991
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
An improved formulation relating the contact angle to the surface coverage is presented and verified. The Ohmi et al. data (Particle Sci. Technol. 7, 229, 1993) for ultracleaning of wafer surfaces are analyzed and correlated mathematically. It is shown that the new formulation represents the Ohmi et al. and Englander et al. (J. Colloid Interface Sci. 179, 635, 1996) data satisfactorily. In addition, the present study provides some insight into the mechanism of the variation of the surface coverage and the contact angle. (C) 1997 Academic Press.
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收藏
页码：500 / 502
页数：3
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