Iron-mediated growth of epitaxial graphene on SiC and diamond

被引:39
作者
Cooil, S. P. [1 ]
Song, F. [2 ]
Williams, G. T. [1 ]
Roberts, O. R. [1 ]
Langstaff, D. P. [1 ]
Jorgensen, B. [3 ]
Hoydalsvik, K. [2 ]
Breiby, D. W. [2 ]
Wahlstrom, E. [2 ]
Evans, D. A. [1 ]
Wells, J. W. [2 ,4 ]
机构
[1] Aberystwyth Univ, Inst Math & Phys, Aberystwyth SY23 3BZ, Dyfed, Wales
[2] Norwegian Univ Sci & Technol NTNU, Dept Phys, N-7491 Trondheim, Norway
[3] Aarhus Univ, Dept Phys, DK-8000 Aarhus, Denmark
[4] Lund Univ, MAX Lab 4, S-22100 Lund, Sweden
基金
英国工程与自然科学研究理事会;
关键词
RAY FLUORESCENCE SPECTROSCOPY; SILICON-CARBIDE; SURFACE; CARBON; FE; NI; TEMPERATURE; MORPHOLOGY; INTERFACE; GRAPHITE;
D O I
10.1016/j.carbon.2012.06.050
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ordered graphene films have been fabricated on Fe-treated SiC and diamond surfaces using the catalytic conversion of sp(3) to sp(2) carbon. In comparison with the bare SiC(0 0 0 1) surface, the graphitization temperature is reduced from over 1000 degrees C to 600 degrees C and for diamond (111), this new approach enables epitaxial graphene to be grown on this surface for the first time. For both substrates, a key development is the in situ monitoring of the entire fabrication process using real-time electron spectroscopy that provides the necessary precision for the production of films of controlled thickness. The quality of the graphene/graphite layers has been verified using angle-resolved photoelectron spectroscopy, scanning tunneling microscopy and low energy electron diffraction. Graphene is only formed on treated regions of the surface and so this offers a method for fabricating and patterning graphene structures on SiC and diamond in the solid-state at industrially realistic temperatures. (c) 2012 Elsevier Ltd. All rights reserved.
引用
收藏
页码:5099 / 5105
页数:7
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