On the performance of Double-Gate MOSFET circuit applications

被引:0
|
作者
Hassoune, Ilham [1 ]
O'Connor, Ian [1 ]
Navarro, David [1 ]
机构
[1] Ecole Cent Lyon, Lyon Inst Nanotechnol, CNRS, UMR 5270, F-69134 Ecully, France
来源
2007 IEEE NORTH-EAST WORKSHOP ON CIRCUITS AND SYSTEMS | 2007年
关键词
D O I
暂无
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
In this paper, we carry out a quantitative analysis of the performance of Double-Gate (DG) MOSFET circuit applications through various benchmark structures (NAND cell, ring oscillator and voltage controlled oscillator). Simulation results in double-gate fully depleted SOI/CMOS technology of the considered benchmarks under V-dd=1.2V have shown that design with connected gates outperforms design with independent gate control with regard to speed and die area, while design with independent gate control is more appropriate for managing both dynamic and static power.
引用
收藏
页码:89 / 92
页数:4
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