Low temperature chemical vapour deposition of ruthenium and ruthenium dioxide on polymer surfaces

被引：32

作者：

Sankar, J ^{[1
]}

Sham, TK ^{[1
]}

Puddephatt, RJ ^{[1
]}

机构：

[1] Univ Western Ontario, Dept Chem, London, ON N6A 5B7, Canada

来源：

JOURNAL OF MATERIALS CHEMISTRY | 1999年 / 9卷 / 10期

关键词：

D O I：

10.1039/a902470k

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin films of ruthenium or ruthenium dioxide can be prepared on polymer films supported on aluminium disks by chemical vapour deposition (CVD) from the volatile precursor ruthenium tetroxide, RuO4, by using hydrogen as reducing carrier gas. On very thin (ca. 0.7 mu m) spin-cast polymer films on aluminium, ruthenium metal was deposited under mild conditions. These ruthenium films were crystalline when formed on polyurethane or poly(methyl methacrylate) but mostly amorphous when formed on polystyrene or poly(ether/ester)polyurethane block copolymers. On thicker polymer films (ca. 75 mu m), the films formed were composed primarily of RuO2 with lesser amounts of ruthenium metal. The films were characterized by using XPS, Auger, XANES, XRD and SEM techniques.

引用

页码：2439 / 2444

页数：6

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