Displacement Damage Effects in Irradiated Semiconductor Devices

被引:215
作者
Srour, J. R. [1 ]
Palko, J. W. [1 ]
机构
[1] Aerosp Corp, Los Angeles, CA 90009 USA
关键词
Defect clusters; defects; displacement damage; hardness assurance; NIEL; particle detectors; radiation effects; random telegraph signals; semiconductors; silicon; simulation; solar cells; visible imaging arrays; RANDOM TELEGRAPH SIGNALS; SOLAR-CELL DEGRADATION; INDUCED DARK CURRENT; RADIATION RESPONSE MECHANISMS; FAST-NEUTRON BOMBARDMENT; AS-IMPLANTED DAMAGE; LOW-FREQUENCY NOISE; P-N-JUNCTIONS; HIGH-ENERGY; DEFECT PRODUCTION;
D O I
10.1109/TNS.2013.2261316
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A review of radiation-induced displacement damage effects in semiconductor devices is presented, with emphasis placed on silicon technology. The history of displacement damage studies is summarized, and damage production mechanisms are discussed. Properties of defect clusters and isolated defects are addressed. Displacement damage effects in materials and devices are considered, including effects produced in silicon particle detectors, visible imaging arrays, and solar cells. Additional topics examined include NIEL scaling, carrier concentration changes, random telegraph signals, radiation hardness assurance, and simulation methods for displacement damage. Areas needing further study are noted.
引用
收藏
页码:1740 / 1766
页数:27
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