Self-Heating Effects In Polysilicon Source Gated Transistors

被引:14
|
作者
Sporea, R. A. [1 ]
Burridge, T. [1 ]
Silva, S. R. P. [1 ]
机构
[1] Univ Surrey, Adv Technol Inst, Guildford GU2 7XH, Surrey, England
来源
SCIENTIFIC REPORTS | 2015年 / 5卷
关键词
THIN-FILM TRANSISTORS; FIELD-EFFECT TRANSISTORS; HIGH-PERFORMANCE; TEMPERATURE-DEPENDENCE; N-TYPE; MOBILITY; FABRICATION; DESIGN; TFT; BEHAVIOR;
D O I
10.1038/srep14058
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Source-gated transistors (SGTs) are thin-film devices which rely on a potential barrier at the source to achieve high gain, tolerance to fabrication variability, and low series voltage drop, relevant to a multitude of energy-efficient, large-area, cost effective applications. The current through the reverse-biased source barrier has a potentially high positive temperature coefficient, which may lead to undesirable thermal runaway effects and even device failure through self-heating. Using numerical simulations we show that, even in highly thermally-confined scenarios and at high current levels, self-heating is insufficient to compromise device integrity. Performance is minimally affected through a modest increase in output conductance, which may limit the maximum attainable gain. Measurements on polysilicon devices confirm the simulated results, with even smaller penalties in performance, largely due to improved heat dissipation through metal contacts. We conclude that SGTs can be reliably used for high gain, power efficient analog and digital circuits without significant performance impact due to self-heating. This further demonstrates the robustness of SGTs.
引用
收藏
页数:11
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